ZnO: Al Transparent Conductive Films' Function Research And It's Application On The Thin Film Solar Cell

In the work, mid-frequency pulse magnetron sputtering is used to prepare ZnOrAl thin films used as the back reflector of the thin silicon films solar cells. The best techological condition was obtained by optimizing the preparing conditions, (VAr is decided by the deposition rate, target voltage:265V, gas pressure:0.6Pa, the high base vacuum is expected.For the sake of the best reflectivity, the optimized ZnO:Al film thickness of 1000A was achieved by theories calculation and exprimental analysis. The n- c-Si, which could endure the grain bombard, was used as n-layer of the solar cell with ZnOrAl/Al back reflector well.Many measures were adopted to decrease bombard in order to improve the solar cells propertivity, such as decreasing target voltage, increasing target distance, accelerating the movement of the substrate. By optimizing the experimental conditions, short-circuit current was increased by 3.7mA/cm2, the conversion efficiency was increased by 2%, the stability was improved.