Effects On Transmittance And Surface Characters Of Thin Films Using O2 Plasma Treatment

Recently,people are paying more attention to the technology of plasma cleaning.Plasma cleaning can be used in a many fields,such as in the surfaces of metals,plastics,glasses,polymer.etc.Comparing to the traditional technology of cleaning,it is used wildly because it will not do harm to enviroment.And it is still a new thought of treatment in optical components and thin films.With the development of high energy laser,there are a great need of high quality optical componets.But there are a lot of disfigures and contaminations on the surface of the optical components and thin films produced by normal ways which will bring a lot of problems to high energy lasers when they are on work.And they can't be got rid of by normal technology of cleaning completely.The specialty of the plasma cleaning of no contaminations and no leftovers gives us a new thought and way to solve the problems.The following are main achievements of this dissertation:1 We test the changes of laser transmittance after cleaning. According to the relationship of thin film thickness and transmittance,we analysis the effect on thickness of thin film layers after plasma cleaning. And according to the relationship of impurity and water on the surface of samples and light transmittance,we also analysis the function to clean impurity and water of plasma cleaning.2 We test the changes of surface roughness after cleaning.According to the changes of roughness of large areas tested by surface profiler and smallareas tested by AFM,we analysis the the effect on surface structure of the sample by using plasma etching and plasma burnin&plasma striking.And we also analysis the different changes by different time treatment.3 We test the changes of surface wetness after cleaning.According to the changes of surface contact angles of samples.we analysis the function of plasma etching.We also analysis the physical and chemical actions on the surface of samples.