Profile Control And Detection Of Holographically Recorded Photoresist Grating Masks

The exposure and development of the holographically recorded grating masks made of photoresist are investigated systematically in this paper. Models of exposure and development are established to simulate and analyze the final profile of the grating masks, which were compared to the experimental results. The models are proved to be concise by the agreement between the simulation and experiments.According these models, the ties between the final profile of the grating masks and exposure volume, concentration of the developer and the spacial frequency are simulated and analyzed, which are confirmed by the experiments. Based on modeling and analysis, some general conclusions are reached as guides for the fabrication of the grating masks with qualified profile.In order to control effectively the profile of the grating masks, the real time monitoring are adopted in the development. Also according the models of exposure and development, rigorous coupled wave theory(RCWT) are used to simulate the monitoring curves of glass_substrated grating masks and grating masks made on top of the chrome film. Experimental results agreed very well with simulations of two kinds of grating masks respectively. Characteristics of the monitoring curves are studied to estimate the state and stage of the development which made the real time monitoring much more effective。A spectroscopic method was proposed for the detection of profile of holographical photoresist grating mask made on top of chrome film in this paper. RCWT was also applied to analyze the relationship between zero order reflected spectrum and the profile of...