Preparation And Properties Of Titanium Silicon Compound Thin Films Deposited On Glass By APCVD

The paper is reviewed the properties of titanium silicide that is about the applications in the field of IC(intergrated circuit) and the techniques of preparation in detail.At the same time ,It is described about the technics of Low-E glass and it's the direction of evolution at length. The titanium silicide fims were prepared on glass substrate by atmospherical pressure chemical vapor deposition using SiH₄ and TiCl₄ as the precursors and diluted N₂,simulated the technics of coating on line,in the deposition reaction temperature about 640-730℃. The phase structure of the thin films was identified by XRD,the surface morphology and the thickness of the thin films were observed by FESEM, and the sheet resistance and optical behaviors of the thin films were measured by the four-point-probes and Spectrometer,the resistance of corrosion of the thin films was measured by EDX ,respectively. We reserched the relationship between of the resulant and mole ratio of SiH₄ with TiCl₄ of the precursors,and the temperature of deposition,respectively. It is favorable to plant single crystal phase with increasing the concentration and the temperature of deposition. The results show that the Ti₅Si₃ or TiSi₂ thin films can be steadily prepared by the fixed mole ration of SiH₄ and TiCl₄,as 2.6 or 3.5,respectively. The properties of the thin films were researched about the electrics opticals resistance of corrosion in acid(H₂SO₄) or alkaline(NaOH) solution as functions of deposition temperature. The results show that the properties of the resistivity IR-reflection resistance of corrosion were improved , increased the films phase content growed in the size of the phase decreased the boundary of the phase,compacted the structure with increasing the deposition temperature ,respectivity. The titanium silicide compound transparent coating of glass that there is suitable transparent ratio higher infrared reflectivity lower emission ratio and excel resistance of corrosion in acid or alkaline solution has be planted by controling the temperature of deposition. The results show that the least resistivity can be obtained, the Ti₅Si₃ coating resistivity about 107μΩ·cm as the deposition 710℃ or the TiSi₂ coating resistivityabout 43 μΩ·cm as the deposition 720℃ respectively. Moreover,the least corrosion velocity of the Ti₅Si₃ or TiSi₂ coating is about 0.110nm/min or 0.232nm/min in 1N acid solutio,and 0.330nm/min or 2.186nm/min in 1N alkaline solution,respectively. So the experiment results show that the titanium silicon compouds (Ti₅Si₃ TiSi₂) will become the novel promising coating of glass which has the characteristics of shielding solar infrared and reflecting the middle-far infrared in the future.