Investigation Of Diamond-like Carbon Films Deposited By PECVD

Diamond-like carbon (DLC) film with excellent physical, chemical properties, such as high hardness, low friction coefficient, good wear resistance, in the infrared band of transparency, inert chemical and biocompatibility, So that they are in such a vacuum micro-electronics, tribology,opto-electronics , acoustics, medical materials, industrial packing up, loading Ying decoration in industry areas a huge potential for application; But also with the preparation of the diamond film, DLC film has a simple preparation, fast and low cost, that is, the higher cost.So more and more people were concerned about it.In this paper, the use of the inductively coupled- plasma enhanced chemical vapor deposition (IC-PECVD) dielectric barrier methods and plasma enhanced chemical vapor deposition (DBD-PECVD) of the DLC film deposition method, Selection of CH4, C2H4 and C2H2 for the gas discharge, as the silicon substrate. Through infrared spectral analysis of the DLC film composition, the use of atomic force microscope (AFM) studied the hardness and the surface topography of film, the use of steps measured the thickness of the film, arrived at the deposition rate. We studid the effects of different growing conditions for the synthesis of thin film microstructure, surface morphology, sedimentation rate and the mechanical properties of the film.Through infrared spectral analysis to know the major components of the films for the CHx (x = 1,2,3) group; The AFM results show that , DLC film is deposited by two ways , CH4 as gas discharge for thin-film deposition under the same conditions, smaller roughness and higher hardness than the other two gas deposition of thin films ; The IC-PECVD method for DLC film deposition, Various gas-discharge, the cavity in different locations, the film deposited with the performance of the deposition conditions inconsistent with the law; DBD-PECVD method for the DLC film deposition, a different discharge gas deposits with the performance of thin film deposition conditions are inconsistent with the law.