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The Study And Development Of 254nm Low-pass Filter

Posted on:2011-09-13Degree:MasterType:Thesis
Country:ChinaCandidate:R Z ZhangFull Text:PDF
GTID:2132360302490041Subject:Instrument Science and Technology
Abstract/Summary:PDF Full Text Request
The 254nm wavelength of UV source is widely used in medical, chemical, printing, public security, archaeological and other departments and also scientific fields. According to the designed requirements of UV systems, low-pass filter was studied and developed on K9 glass substrates with high reflectivity at 254nm and high transmissivity in visible spectrum range. According to the film designed theory, low-pass interference filter film was obtained by optimizing of Needle method. The electron-beam evaporation materials of HfO2 and MgF2 were studied. The problem of splash was solved and the absorption was decreased. Via Kaufman ion source,the film density was improved,also the problem of spectral curves of drift was solved and the quality of the film was meliorated by optimizing the process parameters.
Keywords/Search Tags:UV low-pass filter, Kaufman ion source, electron beam evaporation, material absorption
PDF Full Text Request
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