Desigh Of High-Frequency High-Power Pulse Bias Power Supply

Magnetron sputtering with its two features of "high speed" and "low temperature" is widely used in the field of thin films. The DC bias power supply widely used in magnetron sputtering ion-plating has constrained the development of magnetron sputtering. So the high-frequency high-power pulse bias power supply becomes the development trend of magnetron sputtering power supply.In this paper, a high-frequency high-power pulse bias power supply is designed using TI's high-performance DSP-TMS320F2812.Based on the indicator requirements of pulsed bias power supply, the concrete scheme for the pulsed bias power supply with high-frequency and high-power is proposed. The structure and parameters of main circuit and control circuit are designed in theory and a deeply research. In order to improve power system stability and anti-jamming ability, a small-signal model of power system is build. Then digital controller is proposed and also analyzed in detail. In the meanwhile, PID parameters are prime designed that has good global optimization effect. The control performance is perfect. The simulation analysis of the entire system is also carried on by the PSPICE and MATLAB software.This article is based on the DSP technology to control the pulsed bias power supply. TI's DSP chip TMS320F2812 as the core of control circuit. Hardware unit such as driver circuit, signal sampling circuit has been designed. Software of control system such as the PWM waveform and the digital PID control also has been designed.Finally, an experimental platform is built which based on simulation and theoretical analysis. Test results validate the simulation analysis and the correctness and feasibility of control program.