Construction Of Roughness Treatment To Pure Titanium Implant Surface And Its Topography Analysis

Objective: The roughness treatment of titanium implant surface could improve bone bonding and increase the success rate of implantation. In this study, sand blasting, sand blasting and acid etching, and sand blasting combined with double acid etching were used to coarse the surface of implants. And the implant surface were treated with different sand blasting materials, different concentration of etching solution and different etching time, and then the morphological changes of their surface were observed by scanning electron microscopy and analyzed by energy dispersive X-ray analysis.Material and methods: Twenty-four HBIC prismatical spiral-shafted implants were divided into five jumpbogroups including twelve subgroups: Group A HBIC pure titanium implants (control group); Group B merely sandblasting of different particles; Group C sandblasting of AL2O3 particles with HCL/H2SO4 solution etching for different times; Group D sandblasting of AL2O3 particles with HF/HNO3 and HCL/H2SO4 solution etching; Group E sandblasting of pure titanium particles with HCL/H2SO4 solution etching. Group A were cleaned ultrasonically with acetone, alcohol, and distilled water, then arescented. Group B were sandblasted with AL2O3 particles or TiO2 particles and then treated as Group A. Group C were sandblasted with AL2O3 particles, and then treated as Group B , and then etched with HCL/H2SO4 solution for 35, 40, 45, 50 and 55minutes respectively, then cleaned by distilled water and finally arescented. Group D were treated as Group B, and then etched with HF/HNO3 solution for 1 minute and with HCL/H2SO4 solution for 45 minutes, then cleaned by distilled water and finally arescented. Group E were sandblasted with pure titanium particles and then etched by HCL/H2SO4 solution for 45 minutes, then cleaned by distilled water and finally arescented. The morphological changes of the implants were observed with scanning electron microscope and the facial elements were analyzed by energy dispersive X-ray analysis.Results:1 The morphology of implant surface with scanning electron microscopeGroup A: Smooth under low power; many scratched regular grooves with the same direction under high power, with dotted hollow occasionally.Group B: The surface sandblasted with titanium particles: fairly regular with no titanium particles left under low power; many irregular and different-sized hollows and fissures with the diameter 1~10μm under high power. The surface sandblasted with AL2O3 particles: rough with many particles left under low power; many irregular holes, pits and geometry lump particles either in the surface or deep layer under high power.Group C: The implants etched with HCL/H2SO4 solution for 35 minutes: slightly rough under low power; there were many particles, and many irregular different-sized hollows and pits with the diameter 1~10μm under high power. The implants etched for 40 and 45 minutes: slightly rough with no obvious particles and foreign materials left under low power; many wavy and shaggy micro bores with many irregular, different-sized, and edge-blunted first class (10~30μm) holes and second class( 1~5μm) holes on the rough surface under high power. The implants etched for 50 and 55 minutes: rough with no particles and foreign materials left under low power; micro bores, large cavities with small ones within, but less first class and second order holes than those in the ones etched for 40 and 45 minutes, shallower cavity and sharp edge under high power, many shallow cavity with no first class holes in the 55 minute group.Group D: Slightly rough under low power; irregular hollows with no foreign materials left under high power, irregular, different-sized, different-depth cavity with the diameter 500nm~3μm, arch-like and sharp edge.Group E: Slightly rough under low power; no obvious irregular hollows, with many cavities, hollows and fissures on the fairly smooth surface under high power, many irregular, arch-like and edge-blunted second class holes with the diameter 500nm~5μm, with different size and depth around the first class ones. 2 Energy-dispersive X-ray analysisTitanium more than 99.50% on group A, and on group B sandblasted with pure titanium particles, Al on group B sandblasted with AL2O3 particles, with 83.84%. Al on group C etched for 35 minutes, with 33.90%; mainly titanium on group C etched for 40 minutes, with 3‰Al; titanium on the ones etched for 45, 50 and 55 minutes with more than 99.50% titanium; group E was the same as group D with more than 99.50% titanium.Conclusion:1 TiO2 sandblasted and coarsened on implant surface was an ideal material which had no pollution to implant and could reach roughness requirement.2 Different diametical aperture holes from micron to nanometer grade could be obtained through TiO2 sandblasting and HCL/H2SO4 mixed solution acid etching for 40 minutes.3 Implant surface sandblasted and coarsened with AL2O3 could reach roughness requirement, but could cause pollution of implant surface if inadequate acid etching and cleaning.4 Micron-aperture holes could be obtained through AL2O3 sandblasting and HCL/H2SO4 mixed solution acid etching for 45 minutes.5 All particles could be removed through AL2O3 sandblasting and acid etching with HF/HNO3 and HCL/H2SO4 mixed solutions, moreover, fairly ideal coursing surface and different diametical aperture holes from micron to nanometer grade could be obtained by this double acid etching treatment.