Design And Applications Of MAPS Simulation Software

Low temperature plasma has a wide range of applications in the semiconductor manufacturing industry including plasma etching, film deposition, etc. The plasma state is determined by external factors, such as parameters of power sources, chamber geometry, and properties of working gas. It exhibits rich nonlinear phenomena over a multiscale of space and time, which brings us great difficulties and challenges on both the reactor design and experimental diagnostics. Effective use of related software simulations can not only help us design plasma sources for industrial application both efficiently and economically, but also assist us scientifically in deep understanding of the complex plasma behaviors occurring in plasma sources. In order to meet the demand of the development of domestic IC(Integrated Circuit) manufacturing, a software with independent intellectual property rights, i.e., the so-called MAPS, has been developed by our research group.In chapter 1, we first briefly review the background, introduce the industrial applications of plasma sources (Capacitively Coupled Plasma, Inductively Coupled Plasma),and industrial demand of the design of chamber for plasma simulation.In chapter 2, there is a brief introduction of foreign plasma simulation software, COMSOL and PEGASUS, including their plasma module and simulation theory.Chapter 3 shows the design of MAPS, both the preprocessing and postprocessing of MAPS has been described comprehensively, including the page setting and the process of modeling. Otherwise, the theory model of solvers MAPS (Fluid model, PIC/MCC model and Global model).In chapter 4, there are two specific examples of MAPS, which simulate the process of CCP and ICP. The results compare with PEGASUS under the same discharge parameters. The numerical results show good agreements with PEGASUS on the shapes and positions of electron density and potential. Both of the two software show that the electron density linear increase with the increase of frequency and voltage, and the plasma potential decrease with the increase of frequency.