The Research In Electrical Conductivity Of Nanometer(Au,Al) Thin Film

Sputtering method in hypobaric atmosphere was used to deposit growth film of Au nanoclusters on the silicon substrate. And there were equally distributed interspaces whose width was several nanometers on the surface of the nano-films. After measuring the Ⅰ-Ⅴ curves of the films from0to20nm, there was nonlinearity of electrical resistivity of samples with the decrease of film thickness. When the thickness reduced to10nm, obvious step phenomenon had been discovered. We carried on an analog computation on the electrical conductivity of film under the normal temperature with the theory of Coulomb blockade and scattering theory, where the electric current was between0and1.5×10-5A. The experimental results were identical with the computation results which showed that Coulomb blockade effect while electrons were transferring in the interspaces caused the Ⅰ-Ⅴ curve presenting nonlinearity and step phenomenon. The first chapter describes the historical development of nano metal films with MEMS processing technology. The second chapter describes the different types of silicon wafer substrate by hydrothermal reactor corrosion and electrochemical corrosion prepared. The surface structure of the substrates were characterized. Nano (Au, Al) films were prepared on substrates with different surface topography. And the surface structure of the nano metal films were characterized too. In the third chapter, conductive properties of nano-metal films with different thicknesses were tested. The results showed that nano-metal Au film resistivity increases with decreasing film thickness. Volt-ampere characteristic curves showed that nonlinear phenomena and step structure appeared. The fourth chapter discusses the scattering effect and Coulomb blockade effects led to nonlinear phenomena of the nano metal films volt-ampere characteristic curves. The simulation results are basically consistent with the experimental results. Chapter5introduces the fluorescence properties of nano metal films. The nanometer metal film can be tested only weak fluorescence phenomenon whose thickness is less than3nm. Fluorescence and nonlinear phenomena indicate that low-dimensional metal films are composed of discontinuous nano-metal clusters. As the size is small enough, the nano metal films appear quantum confinement effect, macroscopic quantum tunneling effect and Coulomb blockade effect. The final chapter summarizes the conclusions of this paper.