Microstructure Of Wide Spectrum And Antireflection

As an important technology of many industries, antireflection is always taken by one layer or multilayer coating. It is easy to cause the film deciduous in practical application. Multiple beam lithography exposure was directly used to pattern the substrate for antireflection in the infrared spectrum and wetting characteristics.A one-dimensional grating was designed and the relationship between exposing time, depth etching with reflectivity was researched in vector diffraction theory. On the basis of the theory results, ravine shape of one-dimensional grating with a infrared wavelength was designed, and grating period of 0.1mm, maximum etching depth and minimum etching depth of 30 nm. the microstructure of the wetting property was also analyzed. And the mutual relations between hydrophilicity and hydrophobicity was researched.The result shows that obvious antireflective effect for the 1.2μm was observed, On the basis of originally, reflectivity falling nearly 50%. In addition, the hydrophobic substrate will be more hydrophobic. The contact angle is reached for 150°, and rolling angle less than 10°.