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Pulsed Bias Arc Ion Plating Of Large Particles To Purify The Theoretical And Experimental Study

Posted on:2005-11-08Degree:MasterType:Thesis
Country:ChinaCandidate:H M GuoFull Text:PDF
GTID:2190360122497039Subject:Plasma physics
Abstract/Summary:PDF Full Text Request
In this paper the academic mode of decontamination of Mps is improved and perfected. The characteristic of pulsed bias sheath ,charge forces and motion of Mps in sheath are studied systemically. A logical explainer of Mps' decontamination under pulsed bias is given theoretically. TiN film samples from different craftwork are observed and analyzed. Configuration of film surface and MPs quantity and dimension are obtained. Analysis and statistic indicate that the experimental result is in accord with calculation result. So it can be proved that the academic mode is correct.In the development of PBAIP our mode give important instruction for gaining clean surface and enhancing film quality on the premise of that aggradations efficiency is not fallen evidently. The idiographic work:(1) Perfection of the mode of MPs decontamination perfectionThe decontamination mode of Dr Meidong Huang's is improved and perfected. Charge and forces on Mps are calculated quantitatively, ion drag force is considered.(2) Pulsed-Bias sheath characteristicThe collisionless sheath mode of Edelberg and Aydil is adopted. The datum come from experiment are regarded boundary condition, voltage distribution in sheath, thickness of sheath, ion and electrons density in sheath are all studied.(3) Charge, forces and motion of Mps in sheathMaking use of the charge balance condition the surface potential of MPs can be gained. Then the charge is obtained. Ion drag force, electric force and gravitation are calculated.It is indicated that the charge on Mps is always negative in the sheath but is reducing when Mps close with electrode. At most region of sheath electric force is greater than the summation of ion drag force and gravitation, so Mps may deviate from electrode. This is the academic gist of Mps decontamination.(4) Experimental resultJSM-5600LV model scanning electron microscope is used to observe the surface morphologies of film come from different craftwork. Then the SEM photos are put into Q500IM model picture analyzer, Mps dimensional distribution and surface density are analyzed statistically.It is indicated that the film surface under pulsed biases is cleaner than the film surface under dc biases. The pulsed parameters are influential to film surface. Little dimensional Mps are cleansed more easily. Voltage and duty cycle are greater the effect is better. (5) Craftwork practiceOn the base of mode and cross experiment the optimized craftwork is obtained, decontaminative impact is 54%. The craftwork meets the request of composing nanometer multiplayer films of Ti/TiN.
Keywords/Search Tags:pulse bias, arc ion plating, macroparticles(MPs), plasma sheath, electric force, ion drag force, nanometer multilayer film
PDF Full Text Request
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