Preparation Of Nano-imprint Technology, And Biomimetic Structure

Nanoimprint lithography (NIL) has been proposed as an alternative approach for the fabrication of nanostructures with critical dimensions in the sub-100 nm range on the wafer scale. It involves two steps: imprinting and pattern-transfer. In the imprinting step, a mold with nanostructures on its surface is impressed into a thin resist film on a substrate. In the pattern-transfer step, an anisotropic etching process such as reactive ion etching (RIE) is used to remove the residual resist in the compressed area, transferring the pattern created by the imprint into the entire resist. The smallest structures that have been successfully fabricated by NIL so far are 6 nm half-pitch lines. And imprinting processes have been already demonstrated on 8 inch wafers with lines, dots and rings. Compared with other lithography techniques, such as Scanning Probe Lithography (SPL), Electronic Beam Lithography (EBL) and Photolithography (PL), NIL has advantages of high throughput, high resolution and low-cost, and thus has been proved as a promising candidate for next generation lithography. In the present work, the whole arts and crafts of nanoimprint lithography will been built firstly, which is the premise of researching, developing and utilizing NIL. Secondly, negative nanoimprint lithography (N-NIL) is demonstrated for fabricating metallic nanostructures. Structural biomimetic study is demonstrated by fabrication of nanostructures, directly using the natural tapered nano-nipple arrays on the surface of cicada wing as bio-template, to mimic natural nanostructures and their special functions. The main achievements of the present work include:(1) The arts and crafts of nanoimprint lithography have been built completely. We studied the every parameter in NIL and optimized the parameters of cleaning substrate, preparing the anti-adhesive layer, spinning the resist, controlling the temperature and pressure during imprinting and transferring the patterns to the substrate, which is the premise of following work.