Dc Reactive Magnetron Sputtering New Type Of Transparent Conductive Zno: Mo Films

Transparent conductive oxide films of ZnO:Mo have been successfully fabricated by using dc reactive magnetron sputtering from metallic targets of Zn/Mo. The dependence of electrical,optical and structure properties of ZMO films on deposition parameters,such as substrate temperature and Mo doping content,have been investigated in detail.XRD and AFM results show that the ZMO thin films have good polycrystal structure.The main research results and analyses as follows:1.From AFM surface morphology of ZMO thin films with different thicknesses, the surfaces of ZMO thin films are smooth and the grains are compact.As the thicknesses of the films are increscent,the average roughness,root-mean-square roughness and peak to valley roughness are increcent.It that as the thickness increase,the grains size largen and the surface roughness is increscent.2.The XRD patterns reveal that ZMO thin films are polycrystalline with the hexagonal crystal structure and the characteristic line of Mo isn't observed.It proves that the characteristic structure of ZnO thin film does not change and any new crystal structure doesn't form after Mo-doping.In the research,the dependence of crystal structure and grain sizes on doping content is not obvious.At 100～300℃,ZMO thin films are polycrystalline,and have strongly preferred orientation of c axis3.At 200℃substrate temperature and 1.5wt%Mo-doping,the films with minimum resistivity of 1.97×10^-3(?)·cm was obtained.The highest carrier mobility is 37.0 cm²V^-1s^-1,while the carrier concentration is 8.57×10¹⁹cm^-3,and the average transmittance is about 80%in the visible light region.The results show that substrate temperature greatly effects on the optical and electical characterization of the IMO thin films.Molybdenum dopant and substrate temperature are the dominant factors to enhance the conductivity.The widening of optical band gap(3.81-3.85eV) was mainly determined by the Burstein-Moss effect.