Preparation And Study Of The Overall Ion Accelerator Of Thin-film Resistor Materials

In order to obtain definite resistance thin films on quartz-glass for ionic accelerator , as the bulk material-quartz-glass tude by electroless Ni-P alloy plating at first, and then adding SiO₂(nanometer)into the plating solution, it can be obtained Ni-P-SiO₂ composite coating of bulk material surface by composite electrodeposition. The surface morphology and microstructure was observed by SEM,XRD,EDX , the surface resistivity was tested by avometer and SDHC digital ,and the corrosion-resisting properties was tested by anodic polarization curves. The mainly conclusions and findings can be summarized as follows: 1) The main processing parameters of electroless plating (pretreatment,content of solution,pH and temperature) were investigated, and the surface morphology and microstructure was observed. The experimental results show that it is a feastble method to substitute palladium activation with nickel activation in quartz-glass tude nickel electroless plating. The electrodepositing solutions and technological parameters of Ni-P alloy coating on quartz-glass tude by electroless plating has been determined through the experimental are decided as follows: NiSO₄·6H₂O:30g/L, NaH₂PO₂·H₂O :30g/L , CH₃COONa·3H₂O:22g/L , C₆H₈O₇ : 18g/L. Temperature-85℃, time-60min and pH value-6．5．2) The main processing parameters of composite electrodeposition (current density and content of solution) were investigated, and the surface morphology, microstructure and the surface resistivity were observed. The results show that the nonconducting quartz-glass tude surface can have definite resistance by composite electrodeposition,and there were derict relation between resistivity and the content of SiO₂．The resistivity can reach to 5．0×10μΩ·cm as the addition of SiO₂ (%)in the coating.The optimum electrodepositing solutions and technological parameters are decided as follows: NiSO₄·6H₂O : 180g/L; NiCl·6H₂O : 40g/L; H₃PO₃: 40g/L; H₃PO₄:40mL/L, SiO₂: 5g/L, NaCl: 20g/L, C₆H₈O₇: 1．5g/L, sulfosalicylic acid: 1g/L, non-ionic and cation surfactants, and so on. 3) The corrosion-resisting properties and mechanism of resistive films were investigated, the results show that the resistive films have fine corrosion-resisting properties. 4) The process of Ni-P alloy coating by electroless plating and composite electrodeposition mechanism were investigated, the hydrid-electrochemistry allied mechanism might be suggested in chemical deposited Ni-P alloy process by combining some results.The process of composite electrodeposition can explain by two step adsorption mechanism.