Preparation And Application Of Anodic Electrophoretic Resin For Photoresist

With the rapid development of the microelectronics industry, the photoresist for printed circuit board (PCB) get more and more attention. The anode electrodeposition photoresist combined the ultraviolet (UV) waterborne cure technical superiority and the characteristics of anode electric system, gets a broad prospect. This paper focuses on the synthesis of photosensitive waterborne polyurethane and application to anode electrodeposition photoresist and coating, the synthesis of acrylic photosensitive copolymer and application to anode electrodeposition photoresist. The work has been carried out as the following aspects:1. Waterborne polyurethane W-PCD and W-PTMG. were synthesized by linear condensition of isophorone diisocyanate(IPDI)for the diisocyanate monomer, polycarbonate glycol(PCD)or polytetrahydrofuran glycol (PTMG) for the diol monomer, dimethylolpropionic acid (DMPA) as the functional monomer, ?-hydroxyethyl methacrylate(HEMA)as the blocking monomer. The content of DBTDL which influences the reaction system has been researched, and the waterborne polyurethane W-PCD and W-PTMG. were characterized by FTIR,1H-NMR,GPC,TGA,DSC,particle size analyzer, etc. The results shows that: W-PCD and W-PTMG have been prepared and the molecular weight was about 5.20×103~11.5×103g/mol. The partical-size distribution of aqueous dispersions was about 50-500nm under different conditions. W-PCD and W-PTMG used in UV-curable anode electrodeposition coatings was also studied, the properties of the cured film included. The results shows that:As photoresist, the performance can not achieve application requirements, but as electrodeposition coating, the cured film gets good comprehensive performance.2. The acrylic copolymer of poly (2-ethylhexyl acrylate-co-styrene-co-acrylic acid) (PESA) was synthesized by radical solution copolymerization. Then, the acrylic photosensitive copolymer G-PESA was prepared by the reaction of glycidyl methacrylate(GMA)and carboxyl group of PESA. We Used FTIR, 1H-NMR,GPC,DSC and TGA on the copolymer structure study and basic performance research. The results shows that:G-PESA has been prepared and the molecular weight was about 2.44×104~3.89×104g/mol. The glass transition temperature of G-PESA was 27.1~49.0℃,thermal decomposition temperature was 421~429℃the emulsion of the copolymer was explored by TEM,DLS and particle size analyzer. The partical-size distribution of aqueous dispersions was about 10-400nm.The anode electrodeposition film formation process was also studied by the cyclic voltammetry(CV)and control potential electrolysis(CPE).After that, the basic property of the anode electrodeposition photoresist was also studied. We used SEM to observe the image and found the resolution ratio was 40μm, which can meet the requirements of photoresist for printed circuit board (PCB) industry.