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The Research About UV Laser Of Anti-reflection Film

Posted on:2013-12-11Degree:MasterType:Thesis
Country:ChinaCandidate:J YangFull Text:PDF
GTID:2230330377455393Subject:Optical Engineering
Abstract/Summary:PDF Full Text Request
In order to improve the service life and efficiency of solid-state UV lasers, reduce optical losses due to reflection of its the surface of the optical component,improve conversion rate,enhance out putpower of UV harmonic, coateding high through rate antireflective film in optical components surface is the solution to the problem of important method. This article introduces the application of ultraviolet antireflective film, specifically making and reaching high through the antireflective film in working band240nm~280nm.For contenting the job requirement of short wave laser film,use TXX700-type2boxtype vacuum coating machines,use electron beam to ion auxiliary sedimentary system to coated film, adjust technological parameter, improve resistance to laser damage threshold, decrease absorbing capacity of film. According to the theoretical basis of optical thin film,firstly use design software TFC to devise and optimize for the final film,secondly select film material which is suitable for ultraviolet band to comparative analysis,thirdly in JGS1base, manufacture Al2O3/MgF2antireflective film,finally use UV3150spectrophotometer which is produced in Shimadzu Corporation to test result curve. Test its average through rate above99.5percent.Using a continuous laser tester to test their anti-laser damage threshold10J/cm2...
Keywords/Search Tags:optical thin films, ion assisted deposition, laser-induced damage, ultravioletlaser
PDF Full Text Request
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