Preparation And Properties Study Of Al-doped ZnO Films By Magnetron Sputtering

Third generation Transparent Conductiving Oxide （TCO） film Al-dopedZnO（AZO） film has attracted great interest of research. AZO films have been widelyapplied in the field such as transparency electrode,solar cell, flat display, piezoelectricsensors and surface acoustic wave device. In this paper, AZO films and AZO/Alcomposite films were deposited on glass, flexible transparent and flexiblenon-transparent polyimide substrates by magnetron sputtering, with3wt.%Al-dopedceramic target. The main aehievements of the dissertation are expatiated as thefollowing:1) Effects of deposition parameters on the optical properties, electric propertiesand growth rates of AZO films deposited on glass substrates were studiedsystematically. The growth rate increased with the increase of sputtering power at thesame working pressure1.0Pa, and came to73nm/min at the sputtering power of200W;the resistivity of AZO films reached to a lowest point attribute to the naturaltemperature rise to about170℃. The growth rate decreased with the increase ofworking pressure, the growth rate decreased with the increase of working pressureand film deposited at a working pressure of1.0Pa resulted in the minimum resistivitywhen a working power of80W was applied.2) Effects of working pressure and sputtering power on the surfacemorphologies, optical properties, electric properties, microstructure and growth rate ofAZO films were systematically researched. The AZO film of lowest resistivity wasproduced at working pressure2.0Pa. when it was applied higher substrate temperature,AZO film of better crystallization, lower resistivity, more texture was obtained. TheAZO films of best electrical property was produced at2.0Pa and500℃, in whichresisitivity, carrier concentration, mobility and average transmition of visible lightwere9.044×10^-4 cm,3.379×10²0/cm³,20.45m²/Vs and76.83%, respectively.3) A series of AZO films were deposited on a new type of polyimide substratewhose glass transition temperature was higher than250℃. Effects of sputtering powerand substrate temperature on the optical property, electrical property and microstructure were studied. AZO films of2.51×10^-3 cm in resistivity and74.3%in average transmition of visible light was deposited under the condition:150℃substrate temperature,60W sputtering power and1.0Pa working pressure, laying thefoundations for prepareing solar cell on flexible transparent substrate.4) AZO/Al composite back reflector for solar cell were deposited onnon-transparent polyimide substrate. Method of inhancing adhersion was explored.Effcets of sputtering power on the structure, electrical property, optical ptroperty andsurface profile were studied.