Research On Optical Operation In Cr Atom Lithography

Atom lithography based on atom optics is a new method of fabricating nanometer structure. One-dimensional interval using this new technology could directly trace to the laser wavelength, and it’s a ideal fabrication technology of transferring standard in nanometer metrology. Nanostructure fabrication of Na, Cr, Al, Yb and Fe atoms have been realized, and2D or3D nanostructure have been also explored.This thesis introduces the Cr atom deposition system, and detailed the function of the components. Early experiments show that this system is working regularly, and has the capability of depositing Cr nanolines. Now we have achieved the new experiments and get the expected results.Standing wave of laser light functions as array of lenses to focus the moving atoms in atom lithography. The position between standing wave and substrate takes important effect of the depositional nanometer lines’quality. Using the rule of Gaussian beam, a method of precisely identifying the position of standing wave of laser light is reported. By adjusting the precise displacement stage which carries the beam focus lens and reflective mirror, the laser beam is subsequently shielded by depositional substrate. Signal of photoelectric detector is changed because of shielding the standing wave, so we can translate the displacement of standing wave into electrical signal. Positioning the standing wave against substrate achieves by using the value of waist diameter of standing wave of laser light. Theoretical model is accomplished according to the experimental process. The result of numerical computation highly coincides with the experimental record. This method realizes precisely positioning standing wave of laser light against substrate, it provides the experimental basic of deeply studying the nanometer features depending on the distance between standing wave and substrate. The clean method of deposition substrate is researched. We employ the RCA method to clean SiO2/Si(100) substrate, and evaluate the result. Measuring and analyzing the surface of InP substrate are proceeded, so it’s suitable for the deposition. We first get the nanolines on the InP substrate by Cr atom deposition. The nanostructure is measured by AFM microscope, and the interval of lines is (212.9±0.6) nm. Additional, the Cr atom deposition speed,0.06nm/min, is obtained by a simple way. It’s much lower than our expectation.