Dynamics Characteristics Of Silicon Microchannel Growth In Electrochemical Machining

As silicon micro channel array has the special structure, it can be used in many areas, such as micro channel plate, micro chemical industry instruments, micro biochip and micro analysis system and so on. In recent years, along with the fast development of MEMS, the silicon micro channel of high efficiency, miniaturization has steped into the visions of scientific researcher. So the silicon micro channel array has a good prospect of research and application.The preparation process of the silicon micro channel is called electrochemical etching, which is conducted on the basis of the preparation process of the macro porous silicon. The advantages of this method are low cost, easy operation, and can get the higher aspect ratio of the silicon micro channel structure.This paper has research the the dynamics of characterics of channels’growth in electrochemical maching of silicon micro channel with experiment study and the theoretical analysis after the analysis and sum up the literatures concerned, and got the factors include light intensity, tempreture, HF, which affect the rate of channels’growth.