The Study Of Poly-crystalline Silicon Solar Cell Acid Surface Texturing

The main purpose of the texturing of polycrystalline silicon cells is to make poly-silicon surface texture to reduce the reflectivity. Acid etching method weave structure of poly-silicon surface with its mature technology, low-cost advantage to become the main way of Texturing of polycrystalline silicon solar cell industry. HF-HNO3-H2O system is the production of the more common acid etching texturing system. There is an broad study of acid texturing. The acid texturing also is one of the hottest study of poly-crystalline silicon solar cell surface texturing.Based on literature research,The influence of different process parameters to the HF-HNO3-H2O system has been studied.we also has discussed the process optimization to resolve the problem in the industry production of acid etching.First of all, The influence of different volume ratio of HF and HNO3has been discussed in this thesis we also discussed the other factors as well as the concentration of HF and HNO3, the reaction temperature, the reaction time and the stiring rate.With aboved discussion,we obtained a set of process parameters which is suitable for industrial production.Second,We also discussed the influence of the additive to the reaction rate,textured effect and the properties of silicon solar cells.and finally an optimized parameter of the volume ratio of CH3COOH and HF has been obtained.Third, we proposed an optimization method to resolve the problem of "dark line" appeared in the industry production of acid texturing. The "dark line "can be removed when the reaction temperature is6℃, the volume of acid is1:5,the concentration of pre-dissloved silicon is1g/LAbove all, Acid texturing is the main way of poly-crystalline silicon solar cells.And it is different between the industry acid texturing and laboratory studies. Therefore, it is important to study the surface texturing of poly-crystalline silcon solar cells with acid etching.