Research On The Characteristics Of Monocrystalline Black Silicon Solar Cell And The Preparation Of Silver Grid Line On Silicon Surface

In the past half century, the world photovoltaic industry achieved rapid development. The photoelectric conversion efficiency of the solar cell improved greatly and the production cost also reduced significantly. As the alternative resource of fossil energy, PV industry needs to continue to intensify efforts to develop. However, only relying on traditional technology improvements, it is difficult to break through the bottleneck of development. In recent years, with the in-depth study of nanophotonics technology, scientists were trying to use a variety of nanostructures and materials to design new types of solar cell, so as to achieve the purpose of low cost, long life, high efficiency and stability.In this paper, as the substrate, the pyramid/nanowire dual structure surface monocrystalline silicon wafers are used to prepare the black silicon solar cells. Although having excellent antireflection capability, the average photoelectric conversion efficiency of black silicon solar cells is lower than the ordinary monocrystalline silicon solar cells. By quantum efficiency measurement, software simulation and transient surface photovoltage response measurement, it is demonstrated that the main factors affecting the efficiency are surface recombination caused by surface defects and the presence of the dead layer in the nanostructure.Meanwhile, in this paper, silver thin film deposition technology is improved that can be used to prepare the grid line of buried contact silicon solar cells. First, spin protective coating on the wafer surface and use laser to carve a groove. Then, deposit a layer of silver nanoparticles on the wafer surface by using metal nanoparticles assist etching technology and wash away the protective coating. Subsequently, deposit silver film by cathode current in the silver nitrate, potassium nitrate and potassium citrate solution. By using the scanning electron microscope, the surface morphology is observed and the principle of thin film growth is analyzed. By using X-ray diffraction spectra, the grain size is calculated.