| People are more and more concerned about the Ion beam sputter deposition (IBSD) because of its excellent process stability and capable of producing high-quality and superior performance films. Now it has become an important means of preparing high-performance thin film.In this thesis, Transparent and uniform amorphous TiO2films were prepared on K9glass by IBSD at room temperature. X-ray diffraction (XRD), ultraviolet-visible photometer (UV-is) and photoluminescence spectroscopy (PL) were employed as the characterization method. Optical properties, mechanical properties, microstructure and surface morphology of TiO2thin films by IBSD under different conditions were studied, And systematic analysis of the experimental conditions on the properties of TiO2thin films in order to obtain the ideal preparation conditions.The results show that: Ultrathin (20～80nm), uniform (Ra=0.4～lnm) and strong adhesion amorphous TiO2films can be prepared by IBSD. In which thickness and the transmittance of The film increases firstly and then decreases with the increase of sputtering pressure and oxygen flow rate And increases with the increase of beam voltage and sputtering time And increases firstly and then decreases with the decreases flow rate ratio of argon and oxygen Stress of the film increases firstly and then decreases with the increase of beam voltage and increases with the increase of sputtering pressure, Changes of others conditions just contrast to thickness changes. Transmittance and stress of the film decreased with increasing film thickness. The amorphous TiO2film appeared weak crystallization and tending to orient in002peak area after annealing at temperatures400℃for4h. The annealing process was carried out in a furnace with atmosphere environment. Photoluminescence properties of the films were characterized after annealing. Emission intensity of the film is affected by the grain size and crystallization effect. |
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