Fabrication Of V₂O₅ Thin Films By Ultrasonic Spray Deposition And Its Application In Other Aspect

In my dissertation, I systematically expatiated the structure and properties、deposition method and characterization of V₂O₅ thin films as well as the development of the preparation method of V₂O₅ thin films home and abroad at present. We studied a new deposition method to prepare thin films of vanadium pentoxide （V₂O₅）—ultrasonic spray.We had gone deep into analysis of the deposition parameters, which reflected the influence of different deposition time and temperature on the microstructure and the process of growth of V₂O₅ thin films ,and the effect of various substrate temperature（T_s） and substrates （glass、silicon、TiO₂ thin films and SnO₂ thin films） where V₂O₅ thin films were grown on the structural features and surface morphology of vanadium pentoxide films. Also, we analyzed the crystalline phase structure surface、morphology and capability of these films through X-ray diffraction （XRD）、scanning electron microscope （SEM） and spectrophotometry.The experimental result revealed that the structure of V₂O₅ thin films deposited on various substrates all belonged to orthorhombic , and V₂O₅ thin films deposited on glass substrate at T_S<215℃were amorphous-like and deposited at T_S≥215℃were polycrystalline. While the temperature of substrates was calefactive continually, the optimized direction of crystal face changed trom（001）face to （110） face,but when T_s=415℃, the films were strongly oriented towards （110） face. The SEM micrographs shew the process of growing of vanadium pentoxide films. Two order-of-magnitude drop of thin films resistance was observed when the temperature of films rose from room temperature to 380℃. The optical band gap（E_g） of V₂O₅ thin films was found to be about 2.25eV by ultrasonic spray.