Preparation Of Antireflective Film And Investigation Of The Microstructure Modulation

In this paper, SiO₂antireflective film was prepared by sol-gel method on the glasssubstrate with spin coating technology and obtained a set of optimum preparationconditions by researching on the factors of sol aging time, the ratio of mother liquor anddiluent, coating speed, heat treatment temperature, holding time, the ratio of hydrophobicagent and curing temperature. The film’s structure and surface morphology wereinvestigated with XRD, SEM and AFM; Nanoindentation system was used to analyze thefilm’s micromechanical property in different heat treatment temperatures and holding time;Hydrophobic property of the film in different hydrophobic modification conditions wasevaluated by contact angle measuring instrument and FT-IR.The results indicate that the film is mainly piled up by amorphous SiO₂particles. Thefilm has the best optical performance with average transmittance94.6%in the visiblewavelength range which increases about3.3%than that of the uncoated substrate in theoptimum condition of4-day sol aging time, PH value5.5of the sol adjusted by acetic acid,the mass ratio of mother liquor and diluent2:1, coating speed2500r/min with2drops ofthe solution,400℃of the heating treatment temperature and3min of the holding time.After the film was heated at400℃and held for3min, its Rq increased from2.28nmto2.69nm and its nanoindentation hardness and elastic modulus increased from174MPaand1.93GPa to443MPa and5.57GPa respectively which increased155%and189%thanthose before heat treatment. The mechanical property of the film was significantlyenhanced. The hydrophobic property of the film was best when the mass ratio of TMCSand hexane was1:6and the curing temperature was150℃. After treatment in thiscondition, the contact angles of the film increased from19°to101°. The hydrophobicproperty of the film was greatly improved.