Fabrication Of Super-hydrophobic And Low-reflection Surfaces On Silicon Substrate For Solar Cells

Today the world is facing serious energy and environment pressure, the solar cells hasrecently become a hot research field. There are some problems of solar cells, such as the lowabsorption of sunlight and the poor stability affected by abominable environments. Naturalorganisms have a good adaptability in different environments. Some specific structures ofplants and animals directly contribute to the characteristics of optical propagation control,temperature control and self-cleaning. In this study, two kinds of experiment scheme based onthe structure principle have been proposed. The main contents and conclusions are listed inthe following.1) Research of the Mechanism of bionic structure. Some organisms have perfectcharacteristics of hydrophobic and anti-reflection, and the ordered microscopic structures onthe surface play a decisive role. Nanowire/pole structures have an important effect on thecapabilities of the decontamination for the organisms, while the similar nanowire/polestructures may show excellent optical anti-reflection for another organism.2) The optical simulation of the nanostructure base on the RCWA theory via RSOFT andMATLAB. The structure parameters of2D subwavelength grating has an important affect inthe optical properties.3) Wet chemical etching method to fabricate silicon nanowire arrays has been taken. Themorphology, hydrophobicity, optical properties of the structures were measured. In theexperiments, large-area silicon nanowire arrays was fabricated on the surface ofmonocrystalline silicon(100) and by a wet chemical etching method at room temperature. Thismethod based on the galvanic cell reaction, SiNW arrays have been realized by chemicallydepositing Ag nanoparticles on silicon wafers in aqueous HF+AgNO3mixed etching solution.In the test of these silicon wafers, silicon wafer surfaces consisting silicon nanowire arraysshow the characteristics of low-reflection less than5%in the450-790nm wavelength rangeand super-hydrophobicity with a high water contact angle up to150.4) The wet chemical etching method has a poor reproducibility and controllability. In thisstudy, we get a research in the method of nanosphere etching base on the self-assembledmonolayer of nanoparticles. the self-assemble technology of SiO2and PS nanoparticles hasbeen discussed.