The Preparation、Microstructure And Magnetic Prepority Of Ni-Mn-In-Gd Ferromagnetic Shape Alloy Thin Films

The Ni-Mn-In-Gd thin films were deposited on well-cleaned substrate of Si(100),and the composition, 3D morphology, surface roughness, average particle size, thickness depend on different sputtering power, substrate temperature, Ar working pressure and sputtering time are investigated by EDS, AFM and thickness profilmeter. The results show that the composition of thin films is close to the composition of target with the sputtering power increasing, and deviate from the target composition with the increasing of the substrate temperature, Ar working pressure and sputtering time; As the sputtering power increases, the surface roughness, average particle size and thickness increase; The surface roughness of the films decreases, the average particle size decreased first and then increased, the thickness increased first and then decreased when the substrate temperature increase; With the Ar working pressure increase, the thickness and the average particle size decreases, the surface roughness is basically unchanged; With sputtering time prolong, the film thickness increase, surface roughness and average particle size decrease.Polycrystalline Ni51.33Mn33.23In15.43 thin film was deposited by the R.F. Magnetron sputtering on well-cleaned substrate of Si(100). The influence of annealing temperature on the microstructure and magnetic properties of deposited Ni51.33Mn33.23In15.43 thin film are investigated. The increase of annealing temperature decreases the particle size of the surface of Ni51.33Mn33.23In15.43 thin films. The analysis of annealed thin films show that crystallization is fully completed when annealed at 873 K and all the annealed thin films are consisted of parent phase and 14 M modulated martensite phase. And the lattice constant of austenite, cell volume of martensite and mean grain increase with annealing temperature. The initial magnetization curve manifests that the Ni51.33Mn33.23In15.43 thin films is ferrimagnetism. With the increase of annealing temperature, the initial magnetization enhances firstly and then decreases, and reaches the maximum value when annealing temperature is 973 K. The hysteresis loop indicates that Ni51.33Mn33.23In15.43 thin films present the typical soft magnetic.Polycrystalline Ni-Mn-In-Gd thin films were deposited by the R.F. magnetron sputtering on well-cleaned substances of Si(100). We report the influence of sputtering power on the composition and morphology of the deposited thin films. In order to study Gd doping on structure and magnetic properties of the sputtered thin films. These films were annealed at 1073 K for 1 h sealed in vacuum quartz tube with the furnace cooling. These films display ferromagnetic behavior after heat treated and a maximum saturation magnetization of 1.3190E-3 was obtained for the films investigated. The X-ray diffraction patterns of annealed thin films indicated that the heat-treated thin films exhibited mixed L21 austenite phase and martensite. And with increasing of Gd content, martensite phase changed from 10 M to 14 M.