Study On Ultrathin Crystalline Silicon Solar Cells

With the human progress and social development, the development and use of clean energy has become a trend. In recent years, the development of photovoltaic industry rapidly,there have been various forms of solar battery. Although each battery has the advantages and disadvantages of each, but practical solar cells still in crystalline silicon solar cells mainly. At present, crystalline silicon solar cells mainly face two problems, is high cost and low efficiency. To solve the problem of high cost and need to reduce casting, processing technology and component packaging material cost. The ultra-thin wafer production of batteries can be effective section about of crystalline silicon solar cell material costs. At present, the researchers have prepared a variety of ultra-thin crystalline silicon solar cells, for example, the ultra-thin crystalline silicon solar cell with an efficiency of 9.75%(wafer thickness is 25-30 ? m)is achieved on the metallurgical grade substrate; The efficiency of9.5%(wafer thickness is 20?m) ultra-thin crystalline silicon solar cells is realized on the steel substrate. According to the existing research results, it is not difficult to see that there is a low efficiency of ultra-thin crystalline silicon cells. In order to improve the efficiency of ultra-thin crystalline silicon solar cells, the researchers put forward a variety of ultra-thin crystalline silicon solar cell efficiency technology, which includes efficiency technology representative:photonic crystal back reflection technology, namely in the ultra-thin crystalline silicon solar cell at the bottom of the design of back reflection structure, increase the long wave photon absorption; ultra-thin crystalline silicon solar cell on the surface the grating light trapping structure, increase cell light absorption; absorption ability in ultra-thin crystalline silicon solar cell surface using nano texture light to increase the battery; to develop ultra-thin crystalline silicon solar cell materials and surface blunt new passivation layer preparation technology.Because of ultra-thin crystalline silicon solar cell can reduce the material cost of crystal silicon with the help of a number of advantages, the application of battery efficiency technology, is expected to become the effective way to solve the basic problem of crystalline silicon solar cell, so ultra thin crystal silicon battery has become In recent years, the research focus of photovoltaic field.By means of theoretical analysis and experimental study, this paper studies the process parameters and the parameters of the intermediate process in the fabrication process of ultra-thin crystalline silicon solar cells. The preparation process of ultra-thin wafer used in the alkali corrosion thinning method, the main analysis of the impact of super ultra-thin wafer preparation lifetime changes and donor impurities in silicon on minority carrier decay process.Also structural parameters of the ultra-thin crystalline silicon solar cells by theoretical simulation and Optimization optimization of surface anti reflection film, including ultra-thin crystalline silicon solar cell, absorption loss on texture structure optimization and metal back mirror. On the back of the absorption loss mirror for ultra-thin crystalline silicon solar cell,using two-dimensional frequency domain finite difference method(FDFD). Also the analysis and research of ultra-thin crystal the silicon cell preparation process and parameter testing,including the preparation of ultra-thin crystalline silicon solar cell process, ultra-thin crystalline silicon solar cell junction depth and the surface impurity concentration test, ultra-thin crystalline silicon solar cells I-V characteristic test and analysis. The fabrication of ultra-thin crystalline silicon solar cell metal electrodes is different from that of conventional silicon cell metal electrodes, and the advantages of the different points are analyzed.