Metal Organic Chemical Vapor Deposition Heater System Research And Design

Metal organic chemical vapor deposition (MOCVD) is one of the promisingtechnologies to manufacture metal nitride thin film, optoelectronic devices, microwavedevices, and other new synthetic materials. Whether heating system can heat a substratefast and even affects the quality of the epitaxial film, so the heating system is the crucialsubsystem of MOCVD equipment. Diverse MOCVD equipment needs a particular heaterto match the equipment.This thesis firstly described that MOCVD had been extensively used in thesemiconductor industry and introduced each subsystem of MOCVD equipment;contrasted mainstream chamber and heater of domestic and foreign equipment byanalyzing their advantages and disadvantages; so resistant plate heater was chose as theresearch theme. Then from the perspective of the basic theory of convective heat transferthermal radiation, the thesis studied the MOCVD heater by utilizing the FEM. In view ofthe properties of high temperature heater, chose the suitable heater materials. On the baseof the simulation, a three-area resistant plate heater was designed, which could heat alarge dimension graphite plate evenly. By conducting “Compensation Design” for resistordiscs appearance resolved the problem that the influence of thermal deformation of heaterresistor discs which caused uneven temperature and short circuit. Finally, the effect ofdifferent reaction gas and different flow velocity on the temperature distribution had beenverified by simulation, providing a reference in temperature regulation for growth process;simulated the phenomenon that the emissivity of spray and graphite plate surface affectedtemperature distribution in run-test, so special attention should be paid to themaintenance.In the thesis, the heater could meet the needs of large dimension MOCVD reactorchamber; improve the temperature uniformity through fine design of heating discs.