Effect Of Substrate Temperature On ZnO Thin Films Grown By Magnetic Sputtering And The Study Of Their Properties

This paper adopts radio frequency magnetron sputtering to prepare ZnO thin films on substrate made by single crystal silicon, it study the effect of different substrate temperatures to ZnO films morphology, crystallization an shine.The results of the study are as follows: Use radio frequency magnetron sputtering to deposit ZnO films, With the other growth parameters unchanged, regulate and change the substrate temperatures respectively at room temperature,100 ?,200 ?,300 ?,400 ?and 500 ?.Using atomic force microscopy represents the surface morphology of ZnO films, when the middle temperature is 200 ? and 300 ?, the depositional ZnO films is the most smooth, film formation is uniform and compact, the surface's roughness is small.Use X-ray diffraction(XRD) to analyze the crystallographic characteristic of ZnO films,with the increase of substrate temperatures, the intensity of ZnO(002)'s diffraction peak gradually increases, and half-width also shows a trend of decrease, it declares that if merely analyzing from the crystallographic angle, the higher substrate temperatures are more beneficial to the nucleation growth of ZnO. In addition, we also test the photoluminescence spectra of ZnO films, when the temperature is 300 ? the deposition of ZnO films has the greatest ultraviolet/visible and higher light emission intensity, the films can show the better optical quality. By this study we can know that when the substrate temperature is 300 ?thin films of ZnO which is sputter deposited has better film quality. When substrate temperature is too high or too low, it is unfavorable to the crystallization and glowing of ZnO thin films.