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NMR Quantitative Research Of Trace Oxygen Impurities In High Purity Trimethylaluminum

Posted on:2017-12-15Degree:MasterType:Thesis
Country:ChinaCandidate:M L SunFull Text:PDF
GTID:2311330512457202Subject:Chemical engineering
Abstract/Summary:PDF Full Text Request
Trimethylaluminum is a kind of high purity metal organic compound?referred to as MO source?.It is one of the core raw materials for manufacturing high-brightness light-emitting diodes?LEDs?,new-generation solar cells,phase change memories,semiconductor lasers and radio frequency integrated circuit chips.It has important applications in semiconductor lighting,information communication,aerospace and other fields.I was also successfully used in the solar cell of "Shen Zhou" spacecraft and "Dong Fang Hong4" Satellite Platform Series satellites.The localization of manufacturing of trimethylaluminium has completely broken the blockade of foreign countries in this important scientific and technological field of national defense.Studies have shown that the purity of trimethylaluminium should be very high once it was used in making semiconductor chips because the trace impurity has a crucial impact of the electrical and optical performance of semiconductor devices.If the purity cannot meet the requirements,it would lead to serious problem of the growth of epi-wafer.Therefore,it is an important research subject of the analysis of trace impurity for trimethylaluminum.In recent years,with the growth spurt of LED,the demand of MO source is increasing.It is of great significance to realize localization of MO source in China because it will contribute the development of China's semiconductor industry,enhance national defense strength and promote the development of optoelectronics and microelectronics industry.There two major impurities in trimethylaluminum,one is inorganic impurities and the other one is organic impurities,they should be measured by different analytical instruments.Inductively coupled Plasma Atomic Emission Spectrometry?ICP-OES?provides a rapid and effective method for the analyzing inorganic trace impurities.This paper describes the study of measuring the minimum organic oxygen content in trimethylaluminum by using Fourier transform nuclear magnetic resonance?NMR?.NMR has a good sensitivity and detection capability,and can be used to measuring the organic oxygen and other organic impurities in trimethylaluminum.The content of trace oxygen has a big influence of the materials downstream,so it is a key step to determine the minimum oxygen content by NMR analysis.
Keywords/Search Tags:Trimethylaluminium, QNMR, S/N, minimum oxygen content
PDF Full Text Request
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