Numerical Simulation And Analysis Of Temperature Field Generated By The Interaction Of Hollow Laser And Optical Thin Film

Known as optical thin film optical devices can change the characteristics of the beams have been widely used in optical instruments,lighting equipment and optical communications.So the study of laser energy distribution in optical thin films produced by thermal stress has important significance.For the distribution of temperature field of hollow optical thin film under laser irradiation and heat transfer and stress,this paper based on the theory of elasticity,a hollow optical thin film under laser irradiation produced by the interaction of temperature field and stress field.Physical model for heat conduction equations and the thermal elastic equations using the finite element method,obtained in any film time and substrate temperature and stress numerical results.With the help of the physical model,the high against the antireflection film and film two situations are discussed respectively,research and summarize the distribution characteristics of temperature and stress in the hollow under the action of laser,and the hollow laser energy density,dark spot radius on target the material temperature and stress distribution.Through the analysis of numerical results: during hollow laser irradiation,temperature and stress distribution in the existing ring,dark spot radius and the temperature near the peak stress,the increase of laser energy and reduce dark spots radius can improve the temperature and stress intensity distribution of laser energy.Because the hollow space,there are obvious changes of optical thin film temperature on different positions over time,in the optical thin film at the center of the energy convergence phenomenon,so the temperature in the center of the laser irradiation after stop can still continue to rise.In addition,antireflection film surface temperature and stress and the substrate surface had little difference,while for high temperature and anti membrane.The stress in the coating and the substrate surface is obvious.In addition,the temperature rise curve and stress curve show that the stress will reach the critical value before the temperature,so the thermal damage of the optical film should occur after the stress damage.The numerical results obtained in this paper can provide the necessary simulation data for the study of the hollow laser to enhance the thermal conductivity of the Ge substrate and the high reverse film.