Application Of Atomic Laver Deposition On Complex Optical Surface

Atomic layer deposition(ALD)is a technique with outstanding conformality with sequential,saturated and self-limiting surface reaction.Compared to traditional deposition processes,ALD films have advantages in conformality,uniformity and density.In this thesis,some novel applications of ALD in optical fields will be carried on.Single layers of Al2O3,TiO2 and Ir were prepared to investigate their optical properties and growth rates.Anti-reflection coatings were deposited in the inner wall of quartz tube with TiO2and Al2O3as high and low refractive index materials respectively.In addition,ALD Al2O3filmswere used to encapsulate perovskite solar cell,the results showed much better device performance and higher stability than that of the UV glue-encapsulated structures.Based on ALD iridium properties,a novel broadband absorber with high efficiency by depositing nanometer iridium(Ir)film onto porous anodic alumina(PAA)template were proposed.The average absorption was as high as 93.4%from400 to 1 1100nmand the absorption efficiency can reach up to 96.8%for the improved structure of quadrangular frustum pyramid array.And not only the hexagonal latticed structures of PAA template,but also many similar structures based on gratings or holes with square latticed or other latticed mode can realize the broadband high absorption efficiency.The light absorbed within the Ir/Glass interface and the sidewalls of PAA by light funneling effect both contribute to the broadband absorption with high efficiency.This novel absorber,described in this paper,can be manufactured with a low-cost and large-area manner and has potential applications in fields of solar cell,light harvesting,imaging and so forth.