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Controls Of Microscopic Defects In CdZnTe Crystal And Their Electrical Transport Process

Posted on:2019-02-16Degree:MasterType:Thesis
Country:ChinaCandidate:P F WangFull Text:PDF
GTID:2321330563455008Subject:Materials science
Abstract/Summary:PDF Full Text Request
Cadmium zinc telluride?CdZnTe or CZT?crystal,with excellent optical and electrical properties,is recognized as an attractive II-VI compound semiconductor material for fabricating room-temperature nuclear radiation detectors.These radiation detectors have great energy and space resolution for X/gamma ray spectroscopy at room temperature,fast response and high sensitivity.However,in the CZT crystal growth processes of the melt technique,a variety of microscopic defects inevitably exist in CZT single crystal,having serious impacts on the electrical proformance and the carrier transport behavior and thus limiting the application of CZT radiation detector.Therefore,this paper deeply researches In doped Cd0.9Zn0.1Te crystal grown by the modified vertical Bridgman?MVB?method aiming at this problem.All kinds of point defects in crystal and their effects on electrical property and the carrier transport behavior are mainly investigated in this paper,getting semi-quantitative descriptions of various point defects and revealing their microscopic origins.On these bases,the high-resistivity mechanism has been discussed,laying the certain theoretical foundation for obtaining high-quality CZT crystal using for detector.A piece of In doped Cd0.9Zn0.1Te ingot with a diameter of 60 mm was grown by the MVB method.A lot of 5×5×2 mm3 CZT wafers were obtained after axial cutting,mechanical polishing and chemical etching.Then the two types of wafers with obvious bulk resistivity difference were selected from above wafers by current-voltage?I-V?at room temperature.The wafer of relatively high bulk resistivity was named CZT1(about 1.28×1010?·cm)and the wafer of relatively low bulk resistivity was named CZT2?about 1.46×109?·cm?,respectively.Firstly,the electrical performance and the carrier transport behavior of the two wafers were investigated.The result of Hall measurement shows the both conductive type is n type.The results of 241Am?59.5 keV?gamma-ray spectroscopy response tests with variable bias voltages manifest that the electron mobility lifetime products of CZT1(about 1.15×10-33 cm2·V-1)is higher than that of CZT2(about 5.41×10-44 cm2·V-1).The results of Time of Flight?TOF?spectroscopy indicate the ranges of impulse voltage increase with bias voltage increasing,while the drift time(tdr),trapping time??*?and de-trapping time??D?of carriers decrease,and the decreasing degree of?D is larger than?*.The response time and collection efficiency of carriers can be enhanced under high bias voltage.The electron mobility of CZT1 and CZT2 are 936 cm2/Vs and 547 cm2/Vs by calculated respectively.The carriers transport performances of CZT1 are superior to CZT2.Meanwhile,the analytical results of ultraviolet-visiable-near infrared?UV-Vis-NIR?transmission spectra show the both band gap is about 1.493 eV.Secondly,the distribution of all kinds of micro-defects in crystal and their impacts on electrical transport process were investigated.The various recombination center defects were studied by photoluminescence?PL?spectra.The results show that the carrier mobility decreases owing to the existing deep-level recombination center that has an impact on carrier transport performance.The defect levels introduced by various traps were researched by thermally stimulated current spectroscopy?TSC?and theroelectronic effect spectroscopy?TEES?.The simultaneous multiple peak analysis?SIMPA?method was adopted to determine trap-related parameters,such as thermal activation energy,carrier concentration,capture cross section and trap type.The microscopic origins of these traps were identified.The sum of trap levels concentration of CZT2 is greater than CZT1,and thus the ionized impurity scattering possibility of CZT2 is larger than that of CZT1.This may be the reason that CZT2 has relatively low electron mobility.The reducing of deep-level defects amounts in crystal can improve the carrier transport performance under the premise of high resistivity.Lastly,the Fermi-level EF of CZT1 and CZT2 are 0.676 eV and 0.609 eV by I-V curves at variable temperature combined with the relationship between EF and resistivity respectively.The deep donor level EDD leads to EF pinned close to the mid-gap.The more pinned degree,the higher resistivity.The high-resistivity formation mechanism of n type CZT crystal can be explained by combining shallow donor level(In+Cd)and deep donor level(TeCd2+)compensating acceptor level VCd2-derived from Cd vacancy model.The sum of VCd2-concentration and[VCd2--In+Cd]-concentration is greater than In+Cd concentration,and TeCd2+concentration is greater than the value of VCd2-concentration plus[VCd2--In+Cd]-concentration minus In+Cd concentration.
Keywords/Search Tags:CdZnTe, recombination center, trap level, electrical transport performance
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