Construction And Study The Application In Solar Cells Of Graphical Micro-nanostructures By Nanoimprint Technology

In recent years,graphical micro/nano-structures of the material surface have attracted more and more interest of researchers due to their special functions.These patterned structures are widely used in many fields,such as the micro reactor,microelectronic devices,optical and biological etc.Based on UV nanoimprint lithography technology,electrochemical electroforming technology,sol-gel method,roll to roll hot embossing technology,combined with the optical simulation,morphology and structure optimization design,the writer of this paper fabricated and studied the application of micro and nano-structured surface of different materials.Firstly,nickel template with nano-structure?pitch=1 um?was fabricated based on UV nanoimprint technology and electrochemical electroforming technology,and then was applied to imprint metal.Nanostructures in PDMS mold,seed layer by magnetron sputtering,nickel template by electroformed were periodic ordered without much defects in structure.Compared to the embossed cured structure spin-coated by different speed,the optimum spin-coated speed 4000r was selected to fabricate better resist structure with less residue relative to Si original mold.The nickel template could be applied in imprint Al foil to prepare anodic alumina nanotubes?AAO?.The size and cycle of AAO were easy to control.In addition,nickel template could be reused to imprint the Al foil and Pb foil directly.The reflectivity of the metal surface with corresponding structure was reduced.Secondly,TiO₂ hard template was fabricated based on sol-gel method,and successfully used as template in UV imprint technology and hot embossing technology.Polydimethylsiloxane soft template with highly ordered micro pits array structure was used as original template to imprint TiO₂ sol on the substrate.The optimum hot embossing process and after-treatment conditions were explored.This kind of fabrication method was simple and low cost.At the same time,the hardness and Young's modulus of the TiO₂ hard template?H=7.740 GPa;Er=123.554 GPa?was much larger than PDMS film material.TiO₂ hard template can be used as template and repeatedly applied in the UV imprint process and the hot embossing process.Thirdly,roller shaft mold with grating structure was studied by optical simulation and fabricated by CNC technology and large area antireflection film with excellent antireflection was fabricated by roll to roll hot embossing technology.The optimal grating size structure?50-25 um?and roll to roll hot embossing process were explored here.The contact angle?C A?of antireflection film was 146°illustrates that this antireflection film has a good hydrophobic performance.In addition,this kind of antireflection film owned excellent self-cleaning function and mechanical behavior etc.The antireflection effect of the solar cells integrated with this anti-reflection film in large angle incident light range was 96%.Compared to ordinary solar cells,the battery current density and efficiency of the solar cells integrated with this anti reflection film were improved.