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The Performance Study And Optimization Of Robotic Planetary Polishing Mechanism

Posted on:2017-12-18Degree:MasterType:Thesis
Country:ChinaCandidate:Y F JiaFull Text:PDF
GTID:2322330515963895Subject:Mechanical engineering
Abstract/Summary:PDF Full Text Request
With the development of the economics,the need of aspheric optical elements,especially those in large size and with high precision is increasing.The technology of computer controlled optical surfacing(CCOS)is the main method to get the sophisticated optical elements.The robotic numerical control polishing system has low cost and low consumption.Its advantage is so conspicuous for large and inconvenient transportation optical components.The polishing mechanism is a polishing device installed at the end of the robot.Polishing efficiency and precision of optical elements are dependent on polishing mechanism.Removal function is the most important parameter.Studying and optimizing its removal function can improve the polishing precision.The removal function of robotic planetary polishing mechanism was investigated and deduced and its performance curve of removal function is discussed.Also,the tending factor is used to optimize the removal function.The main method of dwelling time calculation and their comparative advantages is deduced.At last,using pulse iteration to calculate the dwelling time and get the residual error.There will produce unbalances when polishing mechanism is operating and the polishing robot will produce a torque.Theoretical analysis of robotic planetary polishing mechanism including motion characteristics and dynamic characteristics is deduced for reducing the unbalances.The accuracy of theoretical analysis is verified through Adams simulation and experiment.The eccentricity of the polishing mechanism is larger and can better balance the centrifugal force after optimization.A new removal function of annular polishing pad based on translation-rotation motion was deduced.Its performance curve is more close to Gaussian distribution and the center removal is more concentrated.The optimal parameters were got after optimization.
Keywords/Search Tags:CCOS technology, polishing mechanism, performance study, optimization, annular polishing pad
PDF Full Text Request
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