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Controlled Synthesis And Surface Enhanced Raman Scattering Of WS2 Flakes

Posted on:2019-10-04Degree:MasterType:Thesis
Country:ChinaCandidate:S HuFull Text:PDF
GTID:2370330566495944Subject:Physical Electronics
Abstract/Summary:PDF Full Text Request
In recent years,two-dimensional graphene-like materials have attracted a great deal of attentions owing to their excellent optical,electronic and mechanical properties.Unlike graphene,as direct band gap semiconductors,single-layered two-dimensional transition metal dichalcogenides?TMDs?have shown great potential applications in many fields.Compared with other two-dimensional TMDs materials,the higher density and molecular weight,strong spin-orbit coupling and bipolar electronic transport properties makes WS2 apply in many fields.However,the controllable synthesis of WS2 still faces a huge challenge.In our report WS2 films were prepared by chemical vapor deposition?CVD?.Not only the effects of different growth parameters on the morphology of WS2 sheets but also the growth mechanism,Raman enhancement effects of R6G molecules on WS2 sheets were studied.The main contents of this paper are as follows:Firstly,WS2 thin films were successfully grown on SiO2?300nm?/Si substrate by traditional low.pressure CVD method.Three controllable growth parameters?the time of S-precursor introduction,the temperature of WO3 precursor and the growth temperature?were considered.It was found that the morphology of the WS2 thin film and the products are highly dependent on the concentration of S and W precursor,and the ratio of W and S atoms?W/S?.If the W/S?1:2,triangular and hexagonal WS2 sheets will be obtained.Whereas,if the W/S>1:2,apart from the WS2 sheet,W nanowires will be formed due to an excess of W atoms.Secondly,the WS2 thin film was successfully prepared on SiO2?300nm?/Si substrate by CVD method.The size of WS2 thin film obtained by atmospheric pressure CVD method was larger than that by low pressure CVD,and the average length of the triangular WS2 film boundary is about200?m.The effects of three growth parameters:the temperature of WO3 precursor,the distance between substrate and WO3 precursor,and the flow rate on the morphologies of WS2 are further analyzed.The results show that it is easier to be controlled and obtain WS2 film,but not W nanowires in low pressure CVD.Finally,SERS of R6G molecule was investigated by using WS2 film as the subtrates.It is found that the single-layer WS2 film has the most prominent Raman enhancement effect on R6G molecules.Besides,the Raman enhancement effect of R6G molecules gradually decreases with the increase of layer number of WS2 film.Our further analysis indicates that the Raman enhancement effect of WS2 film on the R6G molecule is mainly due to the charge transfer between the WS2 film and the R6G molecule.
Keywords/Search Tags:chemical vapor deposition, WS2, Surface Raman Enhancement
PDF Full Text Request
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