Research On Fabrication And Polarization Detection Of Micro Nano Array

Polarization imaging can present the polarization information which is difficult to observe in human vision system.For the polarization imaging sensor with high resolution,it can obtain many complete polarization characteristics from the linearly polarized light,and also can obtain the rich polarization information contained in the target object.In polarization imaging technology,the polarizer is undoubtedly an extremely important component,which can shield the incident light or make it transmit.In recent years,the micro nano technology is becoming more and more mature,and the subwavelength metal grating has better polarization characteristics.This optical component has small volume,simple integration,and great application potential in polarization imaging and other related aspects.In this study,the polarizing grating microarray is used as the object,and the electron beam exposure technology,focused ion beam etching and laser interference technology are used to prepare it.First of all,taking the polarization grating as the core content,this paper analyzes the research background and significance of the polarization grating,expounds the current research and development status of the polarization grating,defines the research content,discusses the equivalent medium and Stokes theory,the former is mainly used to analyze the polarization characteristics of the polarization grating,the latter is mainly used to design the structure of the polarization grating.Secondly,in the aspect of fabrication technology of polarization grating,this research mainly analyzes the manufacturing technology of "visible light interference","focused ion beam etching" and "electron beam exposure",focuses on the electron beam exposure system,and expounds its realization mechanism,manufacturing technology,parameter configuration and their mutual influence,at the same time,it also uses induction isoseparation In this paper,the working mechanism,influencing factors and main performance indexes of the sub body etching technology are summarized.At the same time,the polarization grating microarray with different period is fabricated by using this technology.The main advantages of the technology,the configuration of related parameters and its influence,and the specific preparation process are analyzed.At the same time,the polarization grating microarray with different depth width ratio is fabricated by using the technology.In order to better detect the polarization performance of micro nano structure,a polarization performance detection system is developed in this study.The performance analysis of different kinds of polarization grating microarray is carried out.Firstly,the polarization performance of five kinds of polarization grating with different depth width ratio structure is tested and evaluated.Secondly,the polarization performance is analyzed based on the period,duty cycle and other parameters The influence of grating structure.Atthe same time,the calculation methods of extinction ratio and maximum polarization transmittance are summarized.At the application level,the polarization imaging detection system is developed based on the polarizer produced by the "micro nano" technology,and the polarization characteristic images of man-made and natural leaves are obtained accordingly,which verifies the advantages and feasibility of this polarizer in polarization detection imaging,and expounds the reasons for its advantages.Finally,the development potential of this detection technology is summarized.