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Preparation And Properties Of Ti-W-N Flim And TiN/W-N Multilayer Films By Magnetron Sputtering Method

Posted on:2016-04-22Degree:MasterType:Thesis
Country:ChinaCandidate:C L WangFull Text:PDF
GTID:2371330542986810Subject:Materials science
Abstract/Summary:PDF Full Text Request
As the high-performance machining develops,serving in extreme conditions such as high speed and high temperature,the serious wear,friction,oxide and surface fatigue,greatly limit cutting tools' service life.TiN coatings widely used by domestic enterprises can't satisfy the demands of the processing.Researchers began to add various elements into a single film,especially into Ti-N film,to form composite films,or make multilayered films,in order to achieve more excellent performance.In this work,W-N monolayer film,Ti-W-N composite film,TiN/WN multilayered films were deposited on the stainless steel substrates by a DC reactive magnetron sputtering system.X-ray diffractometer(XRD),scanning electron microscope(SEM)and energy spectrum analyzer(EDS)were utilized to analyze the microstructure and composition of films.The properties of films such as hardness,adhesion and friction coefficient were characterized by microhardness tester,scratch tester,friction and wear testing machine and other equipment.And the process parameters of Ti-W-N composite films were optimized.Research have shown that:(1)During the process of preparation of W-N monolayer film,the deposition rate decreased significantly while the ratio of nitrogen and argon flow rate increases,and the W,W2N and WN phases appeared at different ratio of nitrogen and argon flow rate.When the ratio of nitrogen and argon flow rate is 15:10,the film has the highest hardness 3065HV,the lowest friction coefficient 0.306 and better adhesion 12.05N.In addition,increasing the target power appropriately contributes to improve the mechanical properties of W-N film.(2)Ti-W-N composite films were produced by a double target DC co-sputtering system,and XRD analysis showed that the(Ti,W)N solid solution was formed.When the power of Ti target is 600W,the power of W target is 60W,the flow rate of argon is 30sccm,the flow rate of nitrogen is 6sccm,the workpressure is 0.4Pa and the substrate temperature is 300?,the grain size of Ti-W-N is small,and the film has the best comprehensive performance due to it's compact structure and smooth surface.The best performance of Ti-W-N composite films is as follows:hardness is 4028HV,adhesion is 64N,the friction coefficient is 0.333 and the corrosion rate is 0.003159mm/a.(3)The studies on the Ti-N/W-N multilayered films indicated that,reducing modulation period contributes to enhance the properties of multilayered flims significantly,and while the modulation ratio(1TiN:1W-N)is near to 2:3,multilayered films have the better comprehensive performance.When the modulation ratio(1TiN:1W-N)is 2:3 and the modulation period is 40nm,multilayered films have the best comprehensive performance:hardness is 3065HV,adhesion is 15.5N and the friction coefficient is 0.333.
Keywords/Search Tags:Magnetron Sputtering, Ti-W-N composite film, TiN/WN multilayered films, modulation period, modulation ratio
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