Development Of Magnetic Deflection Electron Beam Evaporation Source

Film growth under vacuum is an essential technology in the field of both new functional materials and nanotechnology.The film growth technology is mainly divided into Physical Vapor Deposition(PVD)and Chemical Vapor Deposition(CVD),wherein the PVD method directly heats and evaporates the source material with the accurately-controlled evaporation speed and the wide-ranged evaporation material.High-energy electron beam bombardment is the main method of vapor deposition of high-melting and low-vapor pressure substances.The existing electron beam bombardment evaporation source in our country is bulky,and it is not suitable for using in an ultra-high vacuum environment and is difficult to meet the demand for the growth of high-performance film.Based on this,this paper developed a magnetic deflection electron beam evaporation source.The overall structure is integrated in a 6-inch ultra-high vacuum blade flange whose structure is compact;it can be set more than one crucible and placed a variety of evaporation source material;its energy of electron beam is adjustable;it can deposit almost all metal materials by evaporation;the overall design is based on the ultra-high vacuum standard and meets the demand for the growth of high-performance film.In this paper,the working principle of evaporation source is introduced in detail.The optimal design scheme is given through theoretical calculation and simulation.After obtaining the best designed parameters of core parts of the evaporation source,the structural design of the magnetic deflection electron beam evaporation source is completed;the three-dimensional and two-dimensional maps of the parts of the evaporation source were drawn and the parts were processed and cleaned;finally,the assembly of the magnetic deflection electron beam evaporation source was completed.Through the actual test by building up a test device,it is confirmed that all the indicators meet the design and practical requirements.The success of this research has promoted our country's international level in the field of ultra-high vacuum electron beam bombardment film growth technology.