| BaTi2O5 material is a promising candidate for a new lead-free ferroelectric material at high temperature,exhibiting high dielectric permittivity(εr)and low dielectric loss(tanδ)at a high Curie temperature(Tc).The research on the BaTi2O5system was focused on the single-crystalline,(010)oriented polycrystalline and polycrystalline BaTi2O5.However,no systematic studies are available for the BaTi2O5 thin film.Due to the miniaturization and integration,BaTi2O5 should be applied as the form of film,which exhibites smaller size than that of bulks.Therefore,the investigation of the properties and structure of the BaTi2O5 thin film is enssential for its application.1.The BaTi2O5 thin films were prepared on Pt(111)/Ti/SiO2/Si substrates via sol-gel process.The optimized temperature and time of annealing process were obtained.The well crystallized BaTi2O5 thin films were obtained at 800–900°C.The BaTi2O5 thin films annealed at 850°C for 30 min had the maximum dielectric permittivity of 210.The dielectric properties of the BaTi2O5 thin film were investigated using temperature dependent dielectric measurements in conjunction with temperature dependent Raman spectra.Diffuse phase transition was found in BaTi2O5 thin film which exhibited a broad peak without frequency dependence on theεversus T,ε(T),curves around 370°C.2.The BaFexTi2-xO5(x=0,0.004,0.008,0.012)thin films were prepared on Pt(111)/Ti/SiO2/Si substrates via sol-gel process and annealed at 850°C for 30 min.The XRD and Raman results indicated that the BaFexTi2-xO5 thin films were in BaTi2O5 single phase,with no evidence of a secondary phase.With increasing Fe3+content,theεr at room temperature increased and showed the highest value of dielectric permittivity(εr=680)at x=0.004,which was about 3 times higher than that of the film with x=0(εr=210).As the Fe3+content was more than 0.004,theεr decreased slightly.Comparing with the dielectric peak of the BaTi2O5 thin films around 370°C,theε(T)curves of Fe-doped BaTi2O5 thin films exhibited near-plateau dielectric permittivity maximum with weak frequency dependency in wide temperature ranges.For the thin film with x=0.012,the dielectric permittivity value was 845+10 in the temperature range of 150-340°C.3.BaZrx Ti2-xO5(x=0,0.002,0.004,0.008)thin films were successfully deposited on Pt(111)/Ti/SiO2/Si substrates via sol-gel process and annealed at850°C for 30 min.The XRD and Raman results indicated that the BaZrxTi2-xO5 thin films were in BaTi2O5 single phase,with no evidence of a secondary phase.With increasing Zr4+content,theεr at room temperature increased and showed the highest value of dielectric permittivity(εr=440)at x=0.004.As the Zr4+content was more than 0.004,theεr decreased slightly.Diffuse phase transition was observed in both BaZrxTi2-xO5 thin films with x=0 and x=0.004.The dielectric permittivity peaks were analyzed by the modified Curie-Weiss law.The results revealed that the diffuse degree of the BaTi2O5 thin films was increased by Zr4+substitution. |