Preparation Of Micro/nano Structures On The Surface Of Monocrystalline Silicon

In last 30 years,solar photovoltaic technology has been greatly developed in terms of research advancement and commercial production scale,marketing exploitation and other aspects.It has became one of the fastest developing industries in the world.However,the conversion efficiency of present Si solar cell is not satisfactory.For higher conversion efficiency,surface engineering combined with nanotechnology is a promising technology road toward this purposeThis thesis studied the preparation of micro/nano structures on the surface of monocrystalline silicon by wet chemical etching.Three aspects of the work have been done.Firstly,n-butyl alcohol is used as additive of alkaline wet etching instead of traditional additives isopropyl alcohol(IPA).And its effect on etching morphology of monocrystalline silicon surface is studied subsequently.SEM results show that near 95%area of monocrystalline silicon surface is covered with uniform pyramid structure under the etching effect of 3%NaOH+3%n-butyl alcohol.The average reflectivity is measured under 15%by Ultraviolet-visible spectrophotometer from 250 nm to 800 nm.Secondly,the function mechanism and surface adsorption phenomenon between n-butyl alcohol and the silicon substrate have been investigated by Materials studio 5.0.Studies have also shown that dynamics simulation for the action of the microstructure formation mechanism of monocrystalline silicon surface with n-butyl alcohol has certain reference function,and has good fit with the experimental results.Thirdly,based on the principle of precious metals added etching,copper ion as a catalyst instead of precious metals(Ag,Au,Pt,etc.)is proposed,and the peak shape structure is prepared on the surface of monocrystalline silicon by two steps chemical etching.After analyzing the formation of the surface morphology and preparation process,we found that the copper ion catalytic chemical etching on the surface of monocrystalline silicon can be used as the key technology of surface texture with silicon-based solar cells.It is worth noting that the average reflectivity is measured under 5%by Ultraviolet-visible spectrophotometer from 250 nm to 800 nm.