Micro-patterned Surface Based On Self-assembly And Their Applications

In the recent years,micro/nanostructured materials are widely applied in microelectronics,biological medicine,catalysis,sensors,energy,etc.and the properties and performance of them are largely dependent on the patterns and morphologies of the material structure.Therefore,the patterned structure fabricating methods attracted intense interest.In this thesis,breath figure arrays with the nanopores,patterned nanorings,patterned nanotubes,patterned silicon wafer and porous polymer films with hierarchical pores have been prepared based on three kinds of novel methods.The main content of this thesis is divided into following five parts:Chapter 1:The patterned preparation method was briefly introduced.Three kinds of patterning methods,namely breath figure method,reactive ion etching(RIE)method and supercritical fluid technology,for the preparation of micro/nanostructure were reviewed and the applications of these structures were briefly introduced.Chapter 2:The preparation of nano-sized porous polymer film based on reactive breath figure process was introduced.Pyridyl group contained polymer polystyrene-block-poly(4-vinylpyridine)(PS-b-P4VP)was selected as the materials to prepare the films.The condensed FA droplets can be instantly fixed by the P4VP composition,thus,the growth and the aggregation of adjacent droplets are effectively restricted.The produced nanoBFA films exhibit excellent anti-reflection performance.This modified BF technique not only facilitates the elucidation of BFA formation mechanism,but also opens a new way fabricating nanoporous structures.Chapter 3:Three kinds of patterned surface were prepared based on reactive ion etching process.Two kinds of patterned catalysis substrates and patterned carbon nanotubes were obtained with the help of colloid crystal self-assembly and magnetic sputtering deposition.And porous silicon wafer with a variety of pore shapes were prepared based on breath figure process and the optical response of azobenzene segments contained in the polymer films.In addition,the mechanism of patterned morphology formation was illustrated in detail.Chapter 5:Porous polymer films were prepared by supercritical carbon dioxide(scCO2)and supercritical carbon dioxide expended liquids(CXL).Two kinds of copolymer were brought to fabricate precursor films by spin-coating,including polystyrene-block-poly(4-vinylpyridine)(PS-b-P4VP)and polystyrene-block-poly(perfluorooctanoic acid)(PS-PFOA).Then the precursor films were modified by supercritical carbon dioxide(scCO2)or supercritical carbon dioxide expended liquids(CXL).And the influence of the additive and solvent was discussed in addition.Chapter 5:The main contents and the significance of this paper were summarized.