| The development of society has brought great convenience to human life and made natural resources overused simultaneously, which led our living environment has become worse step by step. People have created well-being life, at the same time also undermined our survival condition. Environmental pollution,lack of energy is a hot topic in today’s world, in order to solve this problem, for decades scientists have been constantly exploring.Many environmentally friendly new materials have also emerged,titanium dioxide is one of them. At room temperature, titanium dioxide can be use of sunlight to sterilization,degradation of organic pollutants, etc. It will not produce secondary pollution. Since the Japanese scientists Fujishima and Honda found that titanium dioxide can use light to catalyze the decomposition of water, there are many scholars into the research team to the titanium dioxide.Respectively, in the photocatalytic degradation of pollutants, antibacterial,atmospheric purification, optoelectronics, solar cells and many other areas have an important application. Many scholars in the past study, most of the energy applied to the titanium dioxide film modification, so that the absorption peak red shift, while ignoring one transmission or reflection can not fully use all the light. In this paper, an innovative method is proposed to improve the light absorption of titanium dioxide film and the photocatalytic efficiency. Titanium dioxide film combined with surface micro-pattern structure can further enhance the absorption and utilization of sunlight.In this paper, the μPG501 direct write lithography and ion beam etching process to do an in-depth exploration, and to explore a set of effective lithography process, lithography debugging methods and ion beam etching efficient copy of the graphics process. In this paper, SUN-125PSS type positive photoresist is used, the film thickness is 2.5 μ m at 3000 Rpm, And the optimum process for direct lithography is Energy = 56ms, Defoc=5;LSK150 ion beam etching machine in the Plate voltage 500V, beam 100mA; etching rate:glass 9.6 nm / min, quartz 11.7 nm / min, silicon 14.9 nm/ min, carbon steel 20.4 nm / min.The etching rate is directly related to the crystal phase and electrical conductivity of the material. The IBE rate is proportional to the beam, and the larger the Plate voltage is, the faster the etch rate is, but there is no obvious linear relationship.The surface of the micro - patterned titanium oxide film in the photocatalytic performance of a significant increase, compared to flat surface film increased by 47%. And the degradation curves of the complementary graphs tend to be consistent. This indicates that the micro-structure of the surface can enhance the photocatalytic performance of the titanium oxide film, which proves the idea of the first chapter of this paper.In this paper,a series of annealing experiments were carried out to obtain the highest photocatalytic activity of TiO2 thin films prepared by magnetron sputtering at 400℃ for 2h.In this paper, we can see that the photocatalytic efficiency of the short-period grating is higher than that of the long-period grating, about 20% higher than that of the long-period grating. The graphics with quadrangular prism structure has the best catalytic efficiencyit is 58.9% higher than that of the long-period grating and is 32.4% higher than that of the short-period grating. The hexagonal prism structured pattern is less than the quadrangular prism due to the poor pattern of the graphic structure. By comparing the photocatalytic efficiency of the same pattern of different period, the shorter the period the higher the photocatalytic efficiency. The same period, the more complex the graphics structure, the photocatalytic efficiency will increase.The antimicrobial properties of films with a patterned structure are similar to those of photocatalysis, and the antibacterial rate increases with the complexity of the graph. |
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