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Studies On The Structures And Properties Of FTO/TiO2 Multifunctional Energy-saving Coated Glass Prepared By AACVD Method

Posted on:2020-07-04Degree:MasterType:Thesis
Country:ChinaCandidate:W H LinFull Text:PDF
GTID:2381330572466572Subject:Materials Science and Engineering
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With the development of China's economy and society,the status and role of ecological civilization construction has become increasingly prominent.Architectural energy-saving is an important part of environment protection and emission reduction measurement.Energy-saving coated glass has become the focus of architectural energy-saving technology.SnO2:F(FTO)is the ideal material for low-E glass due to its chemical stability,non-toxicity,low cost,high transmittance and high electrical conductivity.Meanwhile,by preparing FTO/TiO2 tandem films,such energy-saving coated glass can simultaneously have outstanding low-emissivity properties and self-cleaning performance.This paper first briefly summarizes the research and application of energy-saving coated glass for building area,mainly including low-emissivity glass and self-cleaning glass.Most of them have concentrated on transparent conductive films represented by FTO and TiO2 film.In order to explore the unclear growth mechanism,complex deposition conditions and further optimization of energy-saving performance,ultrasonic atomization assisted chemical vapor deposition(AACVD)was used to prepare FTO films by selecting precursor solvent,deposition temperature,deposition time,F doping concentration as four experimental parameters.The relationship between the microstructure and macroscopic properties of the films was studied by various material characterization methods.The process and mechanism of the structure and properties of FTO films under different deposition conditions were studied by ellipsometric measurements especially.The nano-TiO2 particles were used as the Ti source to prepare FTO/TiO2 tandem films.The main research contents and results of this paper are as follows:(1)AACVD method has been used to prepare FTO films by changing precursor solvent,deposition temperature,deposition time,F doping concentration as four experimental parameters for controlling film growth process,with monobutyltin chloride and ammonium fluoride as precursors.A rutile phase and columnar grown FTO film was obtained on glass.Experiments were carried out by selecting four solvents:water,ethanol,methanol and isopropanol.It was found that films with the best performance could be obtained only when methanol was used as the solvent,and the chemical components in the precursor were studied by Fourier transform infrared spectroscopy.By controlling the deposition temperature between 350 ?and 500?,it was revealed that a higher deposition temperature not only improved the deposition efficiency,but also enhanced the film crystallinity.(2)The effects of film thickness on the properties of FTO films were studied by changing deposition time from 2 min to 10 min.It was found that when the film thickness was controlled at about 600 nm,the photoelectric properties of the films were optimized.By controlling the F doping concentration in the precursor,the effects of doping concentratiom on the properties of FTO film were studied.It was shown that the doping concentration reached a proper proportion at about 15 at%in the current experiment.Finally,we successfully prepared an excellent FTO film with a sheet resistance of?6 ?/sq and an emissivity of 0.11.This film has a good application prospect in low-emission coated glass and solar cells.(3)The optical structures of the prepared film were systematically analyzed by ellipsometric measurements.The dispersion curves of the films in the long spectrum were obtained,and the variation of the plasma resonance points with the preparation conditions was revealed.An analytical paradigm was obtained,which has a good effect in the analysis of the constitutive relationship of FTO films prepared by AACVD.(4)Meanwhile,the FTO/TiO2 tandem film were prepared by using nano-TiO2 particles as Ti source.Under the condition of UV lamp irradiation for 10 minutes,the hydrophilic angle was 5°,and the low radiation performance was also achieved.The effects of the annealing temperature upon the emittance and hydrophilic properties were also discussed in detail to optimize the process parameters for the applications.The enhancement of the hydrophilicity was attributed to the emerging heterojunction at the FTO/TiO2 interface.
Keywords/Search Tags:ultrasonic atomization assisted chemical vapor deposition, FTO/TiO2 film, low emission performance, hydrophilicity, ellipsometric measurements
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