Vertically Oriented Graphe Nenanosheet's Growth By Mesoplasma Chemical Va(?)or Deposition And Its Application For Strain Sensor

Graphene has always been a research interested due to its excellent electrical,optical and thermal properties.As a special structure of graphene,vertical oriented graphene nanosheets(VGNs)have the advantages of large surface area to volume ratio,sharp edges,and good electrical conductivity.Therefore,the VGNs structure is one of the best candidates in the fields of next-generation electron emission,sensors,energy storage,and biology.However,the research on VGNs has a problem of slow growth rate and unclear growth mechanism.Mesoplasma CVD technology enables rapid and efficient synthesis of thin films in recent years,which may have great potential for rapid preparation of VGNs films.Based on mesoplasma CVD technology,this paper uses its unique medium-pressure plasma to optimize the process conditions to achieve rapid growth of VGNs,and to study its growth mode and application for strain sensors.The following is the main work content introduction:(1)The rapid growth of VGNs is achieved by mesoplasma CVD.The experiment explored the effect of the deposition process on the growth rate.Increasing the RF power and methane flow rate can increase the deposition rate of the VGNs film.The growth rate of VGNs reached 5.8?m/min at a methane flow rate of80 sccm.(2)Two different growth modes are realized by mesoplasma CVD.The effects of different growth parameters on the growth mode of VGNs were studied experimentally.Two different structures of VGNs were obtained by changing the RF power and other conditions:vertical graphene nanosheets and carbon sphere-vertical graphene nanosheet composite structures.(3)A micro-crack strain sensor was prepared by using a mesoplasma CVD technique to prepare a VGNs film with a three-dimensional network structure as a conductive material.The test results showed high sensitivity and sensitivity coefficient at 80%strain,its gauge factor(GF)is 1.10×10~3.