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Research On Standard Template Measurement Technology Based On SIFT Image Stitching Algorithm

Posted on:2020-02-17Degree:MasterType:Thesis
Country:ChinaCandidate:J R ChengFull Text:PDF
GTID:2381330578980085Subject:Engineering
Abstract/Summary:PDF Full Text Request
When measuring a nano-standard template using a high-power objective,it is important to obtain high-resolution template overall area information.Aiming at the problem of small field of view under high magnification objective lens,this paper proposes a standard template measurement technology based on SIFT image mosaic algorithm.The main research contents of this paper are as follows:1)Fully study the basic theory involved in image stitching,combine the measurement information of the standard template,determine that the experiment uses the feature model to complete the image registration,and use the fade-in weighted average method to achieve image fusion.2)Detailed description and in-depth study on the measurement technology based on SIFT image stitching algorithm.By pre-processing and transforming the three-dimensional microscopic image,the image feature detection,RANSAC algorithm purification registration result,image fusion,and finally the overall template information are realized.3)The method of evaluating the step height of the standard model was studied,and the point-to-point step height evaluation and the international standard step height evaluation method were realized.The experiment selected SIMT100 and Xiaoyan 400 standard template to evaluate the height of the step in the whole area.The experimental results show that the measured value of the step height is within the range of the allowable error of the calibration value.4)The one-dimensional pitch evaluation method of the standard template was studied.The fast Fourier transform method and the center of gravity method were used,and the evaluation procedures were compiled.The experiment uses the 10577-003-042 standard template,and uses the stitching technique to obtain the overall grid area,and evaluates the grid spacing of the overlapping areas before and after stitching.The experimental results show that the measured value of the one-dimensional pitch is within the calibration range.The measurement technology proposed in this paper effectively expands the field of view of the objective lens in the lateral and axial measurements,thus obtaining the overall regional information of the standard template.
Keywords/Search Tags:Nanometer measurement, Image stitching, step height, One-dimensional grid distance, SIFT
PDF Full Text Request
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