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The Exploration And Study Of High Quality Graphene Films Prepared By Near-equilibrium PECVD

Posted on:2020-07-22Degree:MasterType:Thesis
Country:ChinaCandidate:J XingFull Text:PDF
GTID:2381330590495985Subject:Optical engineering
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Graphene,as a new type of two-dimensional carbon-based material,has excellent electrical,optical,mechanical and thermal properties.This huge advantage of combining many excellent properties makes it an important new type of two-dimensional nanomaterials which are widely discussed and deeply studied nowadays.At present,the research of graphene is more extensive,focusing on its unique photoelectric properties.High transmittance and excellent conductivity make graphene as a transparent conductive film have broad application prospects.However,in the study of graphene,how to prepare large area and high quality graphene has become a difficult problem that researchers need to tackle urgently.Among many methods of graphene preparation,plasma enhanced chemical vapor deposition(PECVD)can directly and efficiently prepare graphene films on dielectric substrates,which not only avoids the pollution of metal catalysts on samples,but also omits the transfer steps of graphene,and ensures the uniformity of graphene films.Therefore,PECVD method has gradually become the mainstream research direction in the field of graphene film preparation.Firstly,this paper introduces some innovative experimental methods or steps to change many different experimental variables in PECVD method,and observe the effects of these variables on the growth of graphene film and the final sample performance.This paper starts from two innovative graphene growth methods: growth in Faraday cage with stainless steel mesh and growth under high pressure with PECVD,and these reduced the nucleation density of graphene on quartz substrates and slowed down the growth rate in varying degrees.When some methods are used to slow down the growth rate of graphene,the experimental conditions need to be adjusted and controlled.Otherwise,it will be difficult for graphene to nucleate and grow on the substrate.This reaserch needs to constantly adjust the experimental parameters so that the process of carbon source gas decompositiondeposition film formation tends to a near-equilibrium state,so that graphene can grow in a nearequilibrium state in PECVD method,so as to improve the quality of graphene films directly grown on dielectric substrates.In this paper,the near-equilibrium state of graphene films prepared by PECVD is also used to further study the restoration of reduced graphene oxide(RGO)films.Healing RGO thin films with PECVD is the combination of dry and wet methods to prepare graphene thin films.Inspired by the idea of exploring the near-equilibrium state in PECVD graphene growth,some experimental conditions were also changed by some methods.The near-equilibrium state in the process of repairing RGO film by PECVD method was explored,which made the structure of RGO film more perfect and improved the mobility of the repaired RGO film.
Keywords/Search Tags:graphene, plasma enhanced chemical vapor deposition, near equilibrium, restoration, reduced graphene oxide
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