Fundamental Research On Induction Of Arsenic Removal Of Copper Electrolyte By Ti(?) Salt

Arsenic is a common associated element in copper mines.It is one of the elements with the most severe impact on the quality of cathode copper in the copper smelting process.About10%of the arsenic introduced from copper concentrate will enter the copper electrolyte system with the smelting process.As the electrolytic process progresses,arsenic will continue to accumulate in the electrolyte,which poses a serious threat to the quality of copper products and process stability.Therefore,it is necessary to purify the electrolyte to remove arsenic.In the early stage,the research group carried out a lot of research on arsenic removal by copper electrolysis.The developed Ti???salt can efficiently remove arsenic from high-arsenic copper electrolyte?One-time removal of high concentration arsenic below 1 g/L?.And in the purification process,it will not affect the copper and sulfuric acid components in the electrolyte.After fine-tuning the concentration of copper acid,it can be directly injected into the electrolytic system.This article will study the basic information and reaction process of the reaction process of Ti???salt-induced arsenic removal.The main research contents of the paper are as follows:?1?Through experimental testing and data analysis,the reactants in the arsenic removal process were identified as arsenic acid molecules?H3AsO4?and titanyl ions?Ti=O2+?.The phenomena and results of the two different reaction modes of liquid-solid and liquid-liquid were compared and analyzed.It was clarified that the reaction mode of removing arsenic was that Ti???salt was dissolved first to form titanyl ion and then reacted with arsenic.Based on this reaction method,a kinetic experiment was carried out by dissolving the Ti???salt and then mixing with the arsenic-containing solution to skip the influence of the Ti???salt dissolution process.The results show that the arsenic removal process is a zero-order reaction,and its reaction rate is only affected by temperature.The fitting determines the apparent activation energy of the reaction to be 70.25 kJ/mol.?2?The phase change process of the heated phase of the product is studied,and the phase of the product produced by the arsenic removal reaction of the Ti???salt is thus determined.It is composed of H₂(Ti?AsO₄?₂·H₂O and TiO₂ with fine crystal grains and incomplete crystallinity.The molar ratio is 1:1.The relationship between the balance of coexistence of residual Ti and As ions in the solution at the end of the reaction was investigated.It was found that A did not meet the concentration product relationship of the insoluble electrolyte.The coexistence relationship was explored.Control the amount of Ti???salt used in the process of arsenic removal to make the residual Ti concentration around 0.5 g/L.?3?From the experimental results,It is inferred from the experimental results that the reaction process of removing arsenic from the Ti???salt is that the Ti???salt will dissolve and form into titanyl ions(Ti=O²⁺)after being put into the electrolyte,which can interact with arsenic acid molecules The Ti/As is 1:1 association.The associative compound can undergo arsenic acid exchange reaction,and the arsenic can be grown into H₂?Ti?AsO₄?₂?·H₂O crystals,and the arsenic will be hydrolyzed to generate metatitanic acid,and continue to be hydrolyzed to generate TiO₂.And use Gaussian quantitative software to calculate The process of combining Ti and As to form a titanium-arsenic association compound was simulated in the reaction process,which proved that this process can be carried out in solution and has two reaction paths.The energy barrier of the optimal path is 56.20 kJ/mol.This paper uses a combination of experimental research and quantum chemistry calculation is used to clarify the information about the arsenic removal process of Ti???salt precipitation,to preliminary explore the reaction mechanism,and to enrich the basic theoretical system of Ti???salt induced arsenic removal by copper electrolyte,To provide basic theoretical support for the industrial application of the technology.