The Study Of The Preparation And The Photoelectric Properties Regulation Of Vanadium Dioxide Thin Film On Amorphous Glass

Vanadium dioxide?VO₂?,with its obvious metal-insulator transition?MIT?characteristics,is a promising energy-saving material for the future intelligent windows and infrared detection devices.At present,although the well-performing VO₂ thin film materials can be grown in monocrystalline substrates,the monocrystalline substrates is expensive,which makes it hardly impossible to be used in business models.Therefore,the need for low-priced but well-performing processing method becomes pressing to guide the commercial application of VO2films.The main work of this thesis is to prepare VO2 films by pulsed laser technology on the low-priced amorphous glass substrates and study systematically its growth mechanism as well as its regulation of photoelectric properties.Hence,the related studies of this thesis will have certain theoretical guiding significance in the production and application of commercial mode of VO₂ films in the future.Therefore,this thesis is focused on the following researches:?1?The effects of substrate temperature on the structure and phase composition of the film during the preparation of vanadium dioxide films on amorphous glass.The results show that the substrate temperature has a significant influence on the crystal type of VO2 film growing on the glass?low temperature,B type and high temperature,M type?,and the VO2 film growing under the condition of 500°C exhibits the optimum photoelectric properties.?2?The effects of oxygen pressure on the structure and photoelectric properties of the film during the preparation of vanadium dioxide film on amorphous glass.The results show that oxygen pressure has a significant effect on the stoichiometric ratio of VO2,and can also significantly change the phase transition temperature,resistance mutation rate,thermal hysteresis width and optical properties of vanadium dioxide.The M-VO2 film prepared under the condition of 0.9Pa oxygen pressure exhibits optimal photoelectric properties.?3?The VO₂ film prepared on the amorphous glass substrate upon the introduction of rutile TiO2 buffer layer.The results show that after inserting TiO2 buffer layer,the B-VO2 films will be converted into better-structured M-VO2 films after introducing in the TiO2.Based on the analysis of relevant experiment,the crystalline transformation was attributed to the template effect of Ti ions diffusion.Moreover,the characteristics of VO2/TiO2/glass thin films were closely associated with the different thickness of TiO2 buffer layer.The optimized VO₂?60nm?/TiO₂?60nm?/glass film has the best crystallization quality,higher resistance mutation rate??R=5.2×10²?,and optimal maximal visible transmittance(T_-vis)value of 53%when solar modulation ability(?T_sol)was 5.2%.?4?The non-crystalline Cu₅₀Zr₅₀ buffer layer is introduced to the glass substrate and then the vanadium dioxide film is prepared.On this basis,the multilayer composite film has excellent thermochromic performance.The crystallization quality and MIT performance of the VO₂ film are obviously enhanced by the introduction of the thickness-optimized Cu₅₀Zr₅₀ buffer layer.The buffer layer has significantly enhanced the optical properties of the sample,compared with the single-layer VO2/glass thin films,the VO2/Cu50Zr50/glass bi-layer films exhibit better optical performance with an enhanced solar modulation ability(?T_sol=14.3%)and a higher visible transmittance(T_vis=52.3%).